Development of surface figure metrology system based on stitching interferometric method for hard x-ray nano-focusing mirrors

• Project/Area Number: 21760106
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Single-year Grants
• Research Field: Production engineering/Processing studies
• Research Institution: Japan Synchrotron Radiation Research Institute
• Principal Investigator: YUMOTO Hirokatsu Japan Synchrotron Radiation Research Institute, 光学系部門, 研究員 (20423197)
• Project Period (FY): 2009 – 2010
• Project Status: Completed (Fiscal Year 2010)
• Budget Amount: ¥4,550,000 (Direct Cost: ¥3,500,000、Indirect Cost: ¥1,050,000); Fiscal Year 2010: ¥780,000 (Direct Cost: ¥600,000、Indirect Cost: ¥180,000); Fiscal Year 2009: ¥3,770,000 (Direct Cost: ¥2,900,000、Indirect Cost: ¥870,000)
• Keywords: 表面形状計測 / X線ミラー / スティッチング干渉計 / X線光学素子 / X線ナノ集光 / 回転楕円面ミラー

Research Abstract

In this study, we aimed at the realization of hard-x-ray nano-focusing beam using mirror optics. We developed a surface figure metrology system to measure nano-focusing mirror surface. We built a stitching interferometric system by using a white light microscopic interferometer. In this system, the microscopic interferometer measures local surface area of mirror surface, and at the same time, relative angle between local surface areas is measured by using another interferometer. This enables to measure entire mirror surface profile with an accuracy of a nanometer level.

Research Products

• [Presentation] Surface figure metrology system for hard x-ray sub-10-nm focusing mirrors. (2011)
  • Author(s): Hirokatsu Yumoto, Hidekazu Mimura,Takashi Kimura, Satoshi Matsuyama, Yasuhisa Sano, Haruhiko Ohashi,Kazuto Yamauchi, Tetsuya Ishikawa.
  • Organizer: 4th Workshop on Adaptive and Active X-ray and XUV Optics (ACTOP11)
  • Place of Presentation: Diamond Light Source, Oxfordshire, UK, Oral