The method based on QCD-model for planning and controlling a multi-chamber tool and a production network
Project/Area Number |
21760303
|
Research Category |
Grant-in-Aid for Young Scientists (B)
|
Allocation Type | Single-year Grants |
Research Field |
System engineering
|
Research Institution | University of Tsukuba |
Principal Investigator |
ARIMA Sumika 筑波大学, システム情報系, 講師 (60400644)
|
Project Period (FY) |
2009 – 2011
|
Project Status |
Completed (Fiscal Year 2011)
|
Budget Amount *help |
¥6,724,439 (Direct Cost: ¥5,172,646、Indirect Cost: ¥1,551,793)
Fiscal Year 2011: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2010: ¥2,174,439 (Direct Cost: ¥1,672,646、Indirect Cost: ¥501,793)
Fiscal Year 2009: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
|
Keywords | システム工学 / 数理工学 / 統合的生産システム / QCD / 生産スケジューリング / マルチチャンバ装置 / 品質推定 / 予測 / 生産性 |
Research Abstract |
in this research, I studied the method of planning and controlling production tools or a factory line for maximizing the throughput of quality products for nano-scale production in semiconductor manufacturing system. The optimal method of the manufacturing control inside a multi-chamber tool was proposed by applying queuing model with blocking and TOC (Theory of constraints), and it was applied to management at a real factory. Moreover, I created a management method which achieves simultaneously zero-rework, improvement in the throughput of quality products, the improvement in a tool utilization in product-mix production. As the result to apply the method to an actual semiconductor factory, overall equipment effectiveness(OEE) can be improved to 1.4 or more times.
|
Report
(4 results)
Research Products
(13 results)
-
-
-
-
-
[Journal Article] Organized DFM for Total Optimization in Semiconductor Manufacturing2009
Author(s)
T. Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
-
Journal Title
Proceedings of AEC/APC symposium Asia 2009
Related Report
Peer Reviewed
-
[Journal Article] Organized DFM Proceedings of Symposium on Photomask and NGL Mask Technology XVI (PMJ2009)2009
Author(s)
T. Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
-
Journal Title
The International Society for Optical Engineering
Volume: 7379-112
Pages: 1-6
Related Report
Peer Reviewed
-
-
-
[Presentation] Organized DFM for Total Optimization in Semiconductor Manufacturing2009
Author(s)
T.Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
Organizer
Proceedings of AEC/APC symposium Asia 2009
Place of Presentation
東京都・神田一ツ橋記念講堂
Year and Date
2009-11-09
Related Report
-
-
[Presentation] Organized DFM, Proceedings of Symposium on Photomask and NGL Mask Technology XVI (PMJ2009)2009
Author(s)
T.Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
Organizer
The International Society for Optical Engineering
Place of Presentation
神奈川県・パシフィコ横浜
Related Report
-
-