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The method based on QCD-model for planning and controlling a multi-chamber tool and a production network

Research Project

Project/Area Number 21760303
Research Category

Grant-in-Aid for Young Scientists (B)

Allocation TypeSingle-year Grants
Research Field System engineering
Research InstitutionUniversity of Tsukuba

Principal Investigator

ARIMA Sumika  筑波大学, システム情報系, 講師 (60400644)

Project Period (FY) 2009 – 2011
Project Status Completed (Fiscal Year 2011)
Budget Amount *help
¥6,724,439 (Direct Cost: ¥5,172,646、Indirect Cost: ¥1,551,793)
Fiscal Year 2011: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2010: ¥2,174,439 (Direct Cost: ¥1,672,646、Indirect Cost: ¥501,793)
Fiscal Year 2009: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
Keywordsシステム工学 / 数理工学 / 統合的生産システム / QCD / 生産スケジューリング / マルチチャンバ装置 / 品質推定 / 予測 / 生産性
Research Abstract

in this research, I studied the method of planning and controlling production tools or a factory line for maximizing the throughput of quality products for nano-scale production in semiconductor manufacturing system. The optimal method of the manufacturing control inside a multi-chamber tool was proposed by applying queuing model with blocking and TOC (Theory of constraints), and it was applied to management at a real factory. Moreover, I created a management method which achieves simultaneously zero-rework, improvement in the throughput of quality products, the improvement in a tool utilization in product-mix production. As the result to apply the method to an actual semiconductor factory, overall equipment effectiveness(OEE) can be improved to 1.4 or more times.

Report

(4 results)
  • 2011 Annual Research Report   Final Research Report ( PDF )
  • 2010 Annual Research Report
  • 2009 Annual Research Report
  • Research Products

    (13 results)

All 2012 2011 2010 2009 Other

All Journal Article (6 results) (of which Peer Reviewed: 6 results) Presentation (5 results) Remarks (1 results) Patent(Industrial Property Rights) (1 results)

  • [Journal Article] DEVELOPMENT OF SEQUENTIAL ASSOCIATION RULES FOR PREVENTING MINOR-STOPPAGES IN SEMI-CONDUCTOR MANUFACTURING2012

    • Author(s)
      S. ARIMA, U. Sumita, J. Yoshii
    • Journal Title

      Proceedings of International conference on Operations Research and Enterprise Systems

      Volume: No.29 Pages: 1-8

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Virtual Metrology-based Engineering Chain Management by Multi-classification of Quality using Support Vector Machine for Semiconductor Manufacturing2011

    • Author(s)
      Sumika ARIMA
    • Journal Title

      International Journal of Industrial and Systems Engineering No.8 Vol.1, Inderscience publisher

      Volume: 8 Issue: 1 Pages: 1-8

    • DOI

      10.1504/ijise.2011.040763

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Virtual Metrology-based Engineering Chain Management by Multi-classification of Quality using Support Vector Machine for Semiconductor Manufacturing2011

    • Author(s)
      Sumika ARIMA
    • Journal Title

      International Journal of Industrial and Systems Engineering

      Volume: No.7 Vol.5(頁番号未定) Pages: 1-18

    • Related Report
      2010 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Virtual Metrology-based Engineering Chain Management by Multi-classification of Quality using Support Vector Machine for Semiconductor Manufacturing.2010

    • Author(s)
      Sumika Arima
    • Journal Title

      International Journal of Industrial and Systems Engineering Vol.7 No.2

    • Related Report
      2009 Annual Research Report
    • Peer Reviewed
  • [Journal Article] Organized DFM for Total Optimization in Semiconductor Manufacturing2009

    • Author(s)
      T. Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
    • Journal Title

      Proceedings of AEC/APC symposium Asia 2009

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Organized DFM Proceedings of Symposium on Photomask and NGL Mask Technology XVI (PMJ2009)2009

    • Author(s)
      T. Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
    • Journal Title

      The International Society for Optical Engineering

      Volume: 7379-112 Pages: 1-6

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Presentation] DEVELOPMENT OF SEQUENTIAL ASSOCIATION RULES FOR PREVENTING MINOR-STOPPAGES2012

    • Author(s)
      Sumika Arima, Ushio Sumita, Jun Yoshii
    • Organizer
      1st International Conference on Operations Research and Enterprise Systems
    • Place of Presentation
      Tivoli Victoria Hotel Vilamoura, Portugal
    • Year and Date
      2012-02-05
    • Related Report
      2011 Annual Research Report
  • [Presentation] DEVELOPMENT OF SEQUENTIAL ASSOCIATION RULES FOR PREVENTING MINOR-STOPPAGES IN SEMI-CONDUCTOR MANUFACTURING2012

    • Author(s)
      S. ARIMA, U. Sumita, J. Yoshii
    • Organizer
      International conference on Operations Research and Enterprise Systems
    • Place of Presentation
      Algarve, Portugal
    • Related Report
      2011 Final Research Report
  • [Presentation] Organized DFM for Total Optimization in Semiconductor Manufacturing2009

    • Author(s)
      T.Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
    • Organizer
      Proceedings of AEC/APC symposium Asia 2009
    • Place of Presentation
      東京都・神田一ツ橋記念講堂
    • Year and Date
      2009-11-09
    • Related Report
      2011 Final Research Report
  • [Presentation] Organized DFM for total optimization in semiconductor manufa cturing2009

    • Author(s)
      Takashi SATO
    • Organizer
      AEC/APC symposium Asia 2009
    • Place of Presentation
      東京・学術総合センター
    • Year and Date
      2009-11-09
    • Related Report
      2009 Annual Research Report
  • [Presentation] Organized DFM, Proceedings of Symposium on Photomask and NGL Mask Technology XVI (PMJ2009)2009

    • Author(s)
      T.Sato, M. Honma, H. Itoh, N. Iriki, S. Kobayashi, S. Kuwabara, N. Miyazaki, H. Suzuki, N. Yoshioka, S. Arima, K. Kadota
    • Organizer
      The International Society for Optical Engineering
    • Place of Presentation
      神奈川県・パシフィコ横浜
    • Related Report
      2011 Final Research Report
  • [Remarks]

    • URL

      https://sites.google.com/site/3f716arimalab/contact

    • Related Report
      2011 Final Research Report
  • [Patent(Industrial Property Rights)] 最適指標生成装置2011

    • Inventor(s)
      有馬澄佳, 山崎雄大
    • Industrial Property Rights Holder
      有馬澄佳(筑波大学)
    • Industrial Property Number
      2011-146687
    • Filing Date
      2011-06-30
    • Related Report
      2011 Annual Research Report 2011 Final Research Report

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Published: 2009-04-01   Modified: 2016-04-21  

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