Pulse voltage electropolishing of micro-textured surface fabricated by selective laser melting in deep eutectic solvents

• Project/Area Number: 21K14434
• Research Category: Grant-in-Aid for Early-Career Scientists
• Allocation Type: Multi-year Fund
• Review Section: Basic Section 26050:Material processing and microstructure control-related
• Research Institution: The University of Tokyo
• Principal Investigator: 韓 偉 東京大学, 生産技術研究所, 特任助教 (70893709)
• Project Period (FY): 2021-04-01 – 2025-03-31
• Project Status: Granted (Fiscal Year 2021)
• Budget Amount: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000); Fiscal Year 2024: ¥260,000 (Direct Cost: ¥200,000、Indirect Cost: ¥60,000); Fiscal Year 2023: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2022: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000); Fiscal Year 2021: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
• Keywords: Electropolishing / Micro-textured surface / Additive manufacturing / Selective laser melting

Outline of Research at the Start

The EP process is carried out in a eutectic mixture consisting of choline chloride and propylene glycol and, alternatively, ethylene, and the workpiece is 316L SS parts fabricated by SLM with designed micro-texture on surface. Five stages constitute the research plan, including development of experimental setup, fabrication of micro-textured surface by SLM and EP the fabricated parts, fundamental study of EP with DESs and pulse voltage, and EP micro-textured surface.