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Pulse voltage electropolishing of micro-textured surface fabricated by selective laser melting in deep eutectic solvents

Research Project

Project/Area Number 21K14434
Research Category

Grant-in-Aid for Early-Career Scientists

Allocation TypeMulti-year Fund
Review Section Basic Section 26050:Material processing and microstructure control-related
Research InstitutionThe University of Tokyo

Principal Investigator

韓 偉  東京大学, 生産技術研究所, 特任助教 (70893709)

Project Period (FY) 2021-04-01 – 2025-03-31
Project Status Granted (Fiscal Year 2021)
Budget Amount *help
¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000)
Fiscal Year 2024: ¥260,000 (Direct Cost: ¥200,000、Indirect Cost: ¥60,000)
Fiscal Year 2023: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2022: ¥910,000 (Direct Cost: ¥700,000、Indirect Cost: ¥210,000)
Fiscal Year 2021: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
KeywordsElectropolishing / Micro-textured surface / Additive manufacturing / Selective laser melting
Outline of Research at the Start

The EP process is carried out in a eutectic mixture consisting of choline chloride and propylene glycol and, alternatively, ethylene, and the workpiece is 316L SS parts fabricated by SLM with designed micro-texture on surface. Five stages constitute the research plan, including development of experimental setup, fabrication of micro-textured surface by SLM and EP the fabricated parts, fundamental study of EP with DESs and pulse voltage, and EP micro-textured surface.

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Published: 2021-04-28   Modified: 2021-08-30  

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