| Project/Area Number |
22560020
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| Research Category |
Grant-in-Aid for Scientific Research (C)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Thin film/Surface and interfacial physical properties
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| Research Institution | Nagaoka University of Technology |
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Principal Investigator |
ITO Haruhiko 長岡技術科学大学, 工学部, 准教授 (70201928)
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| Co-Investigator(Renkei-kenkyūsha) |
SAITOH Hidetoshi 長岡技術科学大学, 工学部, 教授 (80250984)
SUZUKI Tsuneo 長岡技術科学大学, 工学部, 助教 (00313560)
KANDA Kazuhiro 兵庫県立大学, 工学部, 教授 (20201452)
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| Project Period (FY) |
2010 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,810,000 (Direct Cost: ¥3,700,000、Indirect Cost: ¥1,110,000)
Fiscal Year 2012: ¥520,000 (Direct Cost: ¥400,000、Indirect Cost: ¥120,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2010: ¥3,250,000 (Direct Cost: ¥2,500,000、Indirect Cost: ¥750,000)
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| Keywords | プラズマプロセス / アモルファス炭素系薄膜 / レーザー分光診断 / アモルファス窒化炭素 / 水素化アモルファス炭化ケイ素 / プラズマCVD / 発光スペクトル / アモルファス炭素 / アモルファス炭化ケイ素 / NEXAFS / レーザー分光 / 発光分光 / フリーラジカル |
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| Research Abstract |
The following results are obtained in this project.
(1) The precursors of the nitrogen atoms in amorphous carbon nitride films are identified, and films possessing high-nitrogen contents are successfully fabricated.
(2) The mechanism of the decomposition of the starting molecules are elucidated for the ECR plasma and microwave-discharge flow of rare gases.
(3) Mechanism of the film hardening of amorphous carbon and related materials are elucidated upon the application of radio-frequency bias voltage to the substrates.
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