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Mechanism of Refractive Index Increase Induced in Polymers by Ion Irradiation and Its Application to the Development of Optical Devices

Research Project

Project/Area Number 22656077
Research Category

Grant-in-Aid for Challenging Exploratory Research

Allocation TypeSingle-year Grants
Research Field Electronic materials/Electric materials
Research InstitutionWaseda University

Principal Investigator

OHKI Yoshimichi  早稲田大学, 理工学術院, 教授 (70103611)

Co-Investigator(Renkei-kenkyūsha) YU Seung-jun  早稲田大学, 理工学術院, 助手 (90516668)
Project Period (FY) 2010 – 2011
Project Status Completed (Fiscal Year 2011)
Budget Amount *help
¥3,340,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥240,000)
Fiscal Year 2011: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2010: ¥2,300,000 (Direct Cost: ¥2,300,000)
Keywordsイオン照射 / 屈折率上昇 / 高分子導波路 / 光制御材料 / 高密度化 / 絶縁材料 / 非晶質
Research Abstract

Irradiation of swift ions can be a good tool to give a new function to dielectrics. We carried out this research to clarify the applicability of these ion irradiation effects to polymer materials. We irradiated 1.0-MeV H^<+> ions to a fluorinated polyimide film and the refractive index was measured by spectroscopic ellipsometry. The increment in refractive index reaches as high as 3.3%, much higher than the value observed in SiO_2 glass. Therefore, it is natural to assume that the ion irradiation to the polymer can be a good tool to fabricate a high-performance polymer-based optical waveguide.

Report

(3 results)
  • 2011 Annual Research Report   Final Research Report ( PDF )
  • 2010 Annual Research Report
  • Research Products

    (11 results)

All 2012 2011 2010

All Journal Article (2 results) (of which Peer Reviewed: 2 results) Presentation (9 results)

  • [Journal Article] A Study of the Critical Factor Determining the Size of Etched Latent Tracks Formed on SiO2 Glass by Swift-Cl-ion Irradiation2012

    • Author(s)
      Ken-ichi Nomura, Yoshimichi Ohki, Makoto Fujimaki, Xiaomin Wang, Koichi Awazu, and Tetsuro Komatsubara
    • Journal Title

      Nuclear Instruments & Methods in Physics Research, Section B-Beam Interactions with Materials and Atoms

      Volume: Vol.272 Pages: 1-4

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Journal Article] Shape-Sensitive Reflectance by Nanostructured Metal Attached on an Optical Waveguide-Mode Sensor2011

    • Author(s)
      Kazuki Sato, Yoshimichi Ohki, Ken-ichi Nomura, Makoto Fujimaki, and Koichi Awazu
    • Journal Title

      Nanotechnology

      Volume: Vol.22

    • Related Report
      2011 Final Research Report
    • Peer Reviewed
  • [Presentation] イオン照射によるフッ素化ポリイミドの屈折率上昇とその原因2011

    • Author(s)
      新井之貴, 大木義路, 齋藤圭祐, 西川宏之
    • Organizer
      2011年度放電学会年次大会
    • Place of Presentation
      東京大学(東京都)
    • Year and Date
      2011-11-26
    • Related Report
      2011 Annual Research Report 2011 Final Research Report
  • [Presentation] Various Ion-induced Phenomena Appearing in Dielectric Materials and Their Applications to Optical Devices and Biosensors2011

    • Author(s)
      Y. Ohki, Y. Arai, S. J. Yu, K. Nomura, and M. Fujimaki
    • Organizer
      2011 International Symposium on Electrical Insulating Materials
    • Place of Presentation
      同志社大学(京都府)
    • Year and Date
      2011-09-07
    • Related Report
      2011 Annual Research Report 2011 Final Research Report
  • [Presentation] 高エネルギーイオン照射による非晶質物質の屈折率上昇とその導波路型光制御デバイスへの応用2010

    • Author(s)
      劉昇峻, 上田雄二, 大木義路, 藤巻真
    • Organizer
      第41回電気電子絶縁材料システムシンポジウム
    • Place of Presentation
      秋田
    • Year and Date
      2010-11-16
    • Related Report
      2010 Annual Research Report
  • [Presentation] 導波路型光制御デバイスへのイオン注入効果2010

    • Author(s)
      劉昇峻
    • Organizer
      放電学会若手セミナー2010
    • Place of Presentation
      沖縄
    • Year and Date
      2010-09-15
    • Related Report
      2010 Annual Research Report
  • [Presentation] 高速重イオン照射により絶縁体中に生じる構造変化の機構と微細加工への応用2010

    • Author(s)
      野村健一, 大木義路, 藤巻真, 王暁民, 粟津浩一, 小松原哲郎
    • Organizer
      第23回タンデム加速器及びその周辺技術の研究会プロシーディングス
    • Place of Presentation
      東京大学(東京)
    • Year and Date
      2010-07-03
    • Related Report
      2011 Final Research Report
  • [Presentation] 高速重イオン照射により絶縁体中に生じる構造変化の機構と微細加工への応用2010

    • Author(s)
      野村健一, 大木義路, 藤巻真, 王暁民, 粟津浩一, 小松原哲郎
    • Organizer
      第23回タンデム加速器及びその周辺技術の研究会
    • Place of Presentation
      東京
    • Year and Date
      2010-07-03
    • Related Report
      2010 Annual Research Report
  • [Presentation] 高エネルギーイオン照射による非晶質物質の屈折率上昇とその導波路型光制御デバイスへの応用2010

    • Author(s)
      劉昇俊, 上田雄二, 大木義路, 藤巻真
    • Organizer
      第41回電気電子絶縁材料システムシンポジウム予稿集
    • Place of Presentation
      秋田
    • Related Report
      2011 Final Research Report
  • [Presentation] 導波路型光制御デバイスへのイオン注入効果2010

    • Author(s)
      劉昇俊
    • Organizer
      放電学会若手セミナー2010ポスターセッション予稿集
    • Place of Presentation
      沖縄
    • Related Report
      2011 Final Research Report
  • [Presentation] A Critical Factor Determining the Sizes of Etched Latent Tracks in Silica Glass Formed by Swift Cl Ions2010

    • Author(s)
      Ken-ichi Nomura, Yoshimichi Ohki, Makoto Fujimaki, Xiaomin Wang, Koichi Awazu, and Tetsuro Komatsubara
    • Organizer
      17th International Conference on Ion Beam Modification of Materials
    • Place of Presentation
      Montreal, Canada
    • Related Report
      2011 Final Research Report 2010 Annual Research Report

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Published: 2010-08-23   Modified: 2016-04-21  

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