Development of De-molding Agent-Free Resin Mold for UV Nanoimprint

• Project/Area Number: 23655218
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Polymer/Textile materials
• Research Institution: Osaka Prefecture University
• Principal Investigator: SHIRAI Masamitsu 大阪府立大学, 工学(系)研究科(研究院), 教授 (00081331)
• Project Period (FY): 2011 – 2012
• Project Status: Completed (Fiscal Year 2012)
• Budget Amount: ¥3,900,000 (Direct Cost: ¥3,000,000、Indirect Cost: ¥900,000); Fiscal Year 2012: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000); Fiscal Year 2011: ¥2,470,000 (Direct Cost: ¥1,900,000、Indirect Cost: ¥570,000)
• Keywords: UVインプリント / 樹脂モールド / レプリカモールド / 離型剤フリー / 分解性光硬化樹脂 / 複製樹脂モールド / 分解型光硬化樹脂 / ＵＶインプリント / 表面特性

Research Abstract

The fouling of the quartz mold during the UV imprint process is a serious problem. A process for making the replicated resin mold was established. Furthermore, the replicated resin mold which was not required a treatment with de-molding agent was devised. A relationship between the surface property of the reinmold and that of the UV cured resin surface was evaluated.

Research Products

• [Journal Article] ヘミアセタールエステル部位を有する新規メタクリラートの合成とリワーク型樹脂への応用 (2013)
  • Author(s): 岡村晴之、初瀬達也、白井正充
  • Journal Title: ネットワークポリマー Volume: 35 Pages: 2-7
  • NAID: 130004648286
  • Peer Reviewed
• [Journal Article] Photo-crosslinking of polymeric photobase generator bearing O-acyloxime moieties with low eliminating by-products and high sensitivity (2013)
  • Author(s): K. Suyama
  • Journal Title: React. Funct. Polym. Volume: 73 Issue: 3 Pages: 518-523
  • DOI: 10.1016/j.reactfunctpolym.2012.12.002
  • Peer Reviewed
• [Journal Article] Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin : Application to Novel Resin Mold for UV Imprint (2012)
  • Author(s): S. Horii, K. Yamane, H. Okamura, M. Shirai
  • Journal Title: J. Photopolym. Sci. Technol Volume: 25 Pages: 735-740
  • NAID: 130004833509
  • Peer Reviewed
• [Journal Article] 分解性を有する架橋・硬化ポリマーの合成と応用 (2012)
  • Author(s): 白井正充
  • Journal Title: 高分子 Volume: 61 Pages: 865-867
  • NAID: 10031117777
  • Peer Reviewed
• [Journal Article] Synthesis and Properties of Novel i- and g-Line Sensitive Photoacid Generators Based on 9-Fluorenone Derivatives with Aryl–Ethynyl Units (2012)
  • Author(s): S. Kodama
  • Journal Title: Chemistry Letters Volume: 41 Issue: 6 Pages: 625-627
  • DOI: 10.1246/cl.2012.625
  • NAID: 10030620560
  • ISSN: 0366-7022, 1348-0715
  • Peer Reviewed
• [Journal Article] Photoacid- and Photobase-Generating Monomers for Surface Modification of Cured Resin : Application to Novel Resin Mold for UV Imprint (2012)
  • Author(s): S. Horii
  • Journal Title: J. Photopolym. Sci. Technol. Volume: 25 Pages: 735-740
  • Peer Reviewed
• [Journal Article] Photo-cross-linking of Modified Polystyrene Having Degradable Linkages (2011)
  • Author(s): H. Okamura, E. Yamaguchi, M. Shirai
  • Journal Title: React. Func. Polym Volume: 71 Pages: 480-488
  • Peer Reviewed
• [Journal Article] Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Imprint Lithography (2011)
  • Author(s): D. Matsukawa, H. Okamura, M. Shirai
  • Journal Title: J. Mater. Chem. Volume: 21 Pages: 10407-10417
  • Peer Reviewed
• [Journal Article] リワーク型低収縮性ジメタクリラートとそのUVインプリント材料への応用 (2011)
  • Author(s): 岡村晴之、白井正充
  • Journal Title: ネットワークポリマー Volume: 33 Pages: 74-78
  • Peer Reviewed
• [Journal Article] Photo-cross-linking and De-cross-linking of Modified Polystyrenes having Degradable Linkages (2011)
  • Author(s): H. Okamura, E. Yamaguchi, M. Shirai
  • Journal Title: React. Func. Polym. Volume: 71 Pages: 480-488
  • Peer Reviewed
• [Journal Article] Reworkable Dimethacrylates with Low Shrinkage and Their Application to UV Imprint Lithography (2011)
  • Author(s): D.D. Matsukawa, H. Okamura, M. Shirai
  • Journal Title: J. Mater. Chem., Volume: 21 Pages: 10407-10417
  • Peer Reviewed
• [Journal Article] Reworkable Resin Using Thiol-Ene System (2011)
  • Author(s): H. Okamura, M Shiai
  • Journal Title: J. Photopolym. Sci. Technol., Volume: 24 Pages: 561-564
  • Peer Reviewed
• [Journal Article] リワーク型低収縮ジメタクリラートとそのＵＶインプリント材料への応用 (2011)
  • Author(s): 岡村晴之、白井正充
  • Journal Title: ネットワークポリマー Volume: 33 Pages: 74-78
  • Peer Reviewed
• [Presentation] 分解性を有する架橋・硬化ポリマーの合成と応用 (2013)
  • Author(s): 白井正充
  • Organizer: 高分子学会講演会
  • Place of Presentation: 東京
  • Invited
• [Presentation] Synthesis and UV Curing of Multi-functional Monomers with Degradable Property (2012)
  • Author(s): M. Shirai
  • Organizer: SERMACS 2012
  • Place of Presentation: アメリカ
  • Year and Date: 2012-11-14
• [Presentation] Photoacid and Photobase Generators for UV Curing (2012)
  • Author(s): M. Shirai
  • Organizer: The 2nd International Forum on Radiation Curing Industrial Development
  • Place of Presentation: 中国
  • Year and Date: 2012-09-20
• [Presentation] Photoacid and Photobase Generating Monomers: Photochemistry and Application to UV Imprint Materials (2012)
  • Author(s): M. Shirai
  • Organizer: European Symposium on Photopolymer Science 2012
  • Place of Presentation: イタリア
  • Year and Date: 2012-09-05
• [Presentation] 新規リワーク型多官能メタクリラートのUVインプリント材料への応用 (2012)
  • Author(s): 白井正充
  • Organizer: 第61回高分子年次大会
  • Place of Presentation: 横浜
  • Year and Date: 2012-05-29
• [Presentation] Preparation of Novel Resin Mold fro UV Imprint Lithography using UV-Curable Monomers (2012)
  • Author(s): M. Shirai
  • Organizer: RadTech UV & EB Technology Expo and Conference
  • Place of Presentation: アメリカ
  • Year and Date: 2012-05-01
• [Presentation] 新規リワーク型多官能メタクリラートのUVインプリント材料への応用 (2012)
  • Author(s): 白井正充
  • Organizer: 第61回高分子学会年次大会
  • Place of Presentation: 横浜
• [Presentation] 分解型光硬化樹脂とUVインプリント等への応用 (2012)
  • Author(s): 白井正充
  • Organizer: 第192回フォトポリマー懇話会講演会
  • Place of Presentation: 東京
• [Presentation] 光酸発生剤を活用するフォトポリマー材料に関する研究 (2012)
  • Author(s): 白井正充
  • Organizer: 61回高分子討論会
  • Place of Presentation: 名古屋
  • Invited
• [Presentation] 再可溶化できる光架橋型高分子 (2012)
  • Author(s): 白井正充
  • Organizer: プラスチックリサイクル化学研究会（FSRJ）第15回討論会
  • Place of Presentation: 米沢
  • Invited
• [Presentation] Synthesis and UV curing of multi-functional monomers with degradable property (2012)
  • Author(s): M. Shirai
  • Organizer: SERMACS 2012
  • Place of Presentation: アメリカ
• [Presentation] Preparation of Novel Resin Mold for UV Imprint Lithography using UV-Curable Monomers (2012)
  • Author(s): M. Shirai
  • Organizer: RadTech UV&EB Technology Expo & Conference
  • Place of Presentation: アメリカ
• [Presentation] Photoacid and Photobase generating monomers-Photochemistry and application to UV imprint materials (2012)
  • Author(s): M. Shirai
  • Organizer: European Symposium of Photopolymer Science 2012
  • Place of Presentation: イタリア
  • Invited
• [Presentation] Photoacid and Photobase Generators for UV Curing (2012)
  • Author(s): M. Shirai
  • Organizer: The 2nd International Forum on Radiation Curing Industry Developmen
  • Place of Presentation: 中国
  • Invited
• [Presentation] UV Imprint Lithography: Process, Materials, Materials, and Applications (2011)
  • Author(s): M. Shirai
  • Organizer: Korea-Japan Symposium on Frontier Photoscience
  • Place of Presentation: 韓国
  • Year and Date: 2011-11-29
• [Presentation] Novel Resin Mold for UV nanoimprint: A Demolding Agent Free System (2011)
  • Author(s): M. Shirai
  • Organizer: 37th International Conference on Micro and NanoEngineering
  • Place of Presentation: ドイツ
  • Year and Date: 2011-09-20
• [Presentation] Novel Monomers with Degradable Property and Their Application to UV Imprint Lithography (2011)
  • Author(s): M. Shirai
  • Organizer: Photopolymerization Fundamentals 2011
  • Place of Presentation: アメリカ
  • Year and Date: 2011-06-27
• [Presentation] 離型剤フリーなUVインプリント用モールドのための樹脂材料 (2011)
  • Author(s): 白井正充
  • Organizer: 第60回高分子年次大会
  • Place of Presentation: 大阪
  • Year and Date: 2011-05-25
• [Presentation] リワーク型多官能メタクリラートのＵＶインプリント材料への応用 (2011)
  • Author(s): 松川大作、村上雄基、岡村晴之、白井正充
  • Organizer: 第６０回高分子年次大会
  • Place of Presentation: 大阪
• [Presentation] 離型剤フリーなＵＶインプリント用モールドのための樹脂材料 (2011)
  • Author(s): 堀井俊哉、岡村晴之、白井正充
  • Organizer: 第６０回高分子年次大会
  • Place of Presentation: 大阪
• [Presentation] UV Curing of Reworkable Dendrimers (2011)
  • Author(s): H. Okamura, M. Shirai
  • Organizer: RadTech Asia 2011
  • Place of Presentation: Yokohama, Japan
• [Presentation] Duplication of Mold for UV Imprint Lithography Using UV Curable Resin with Reworkable Property (2011)
  • Author(s): S. Horii, D. Matsukawa, H. Okamura, M. Shirai
  • Organizer: RadTech Asia 2011
  • Place of Presentation: Yokohama, Japan
• [Presentation] Reworkable Dimethacrylates Having Hemiacetal Ester Units (2011)
  • Author(s): H. Okamura, T. Hatsuse, D. Matsukawa, M. Shirai
  • Organizer: RadTech Asia 2011
  • Place of Presentation: Yokohama, Japan
• [Presentation] UV Curing of Reworkable Resin: Analysis of Chain Propagation (2011)
  • Author(s): D. Matsukawa, H. Okamura, M. Shirai
  • Organizer: RadTech Asia 2011
  • Place of Presentation: Yokohama, Japan
• [Presentation] Reworkable Resin Using Thiol-Ene System (2011)
  • Author(s): H. Okamura, M. Shirai
  • Organizer: The 28th International Conference of Photopolymer Science and Technology
  • Place of Presentation: Chiba, Japan
• [Presentation] Novel Monomers with Degradable Property and Their Applications to UV Imprint Lithography (2011)
  • Author(s): M. Shirai
  • Organizer: Photopolymerization Fundamentals 2011(招待講演)
  • Place of Presentation: Breckenridge, CO, USA
• [Presentation] UV Curing and Degradation of Reworkable Methacrylates Having Hemiacetal Ester LInkage (2011)
  • Author(s): Y. Murakami, H. Okamura, M. Shirai
  • Organizer: Photopolymerization Fundamentals 2011
  • Place of Presentation: Breckenridge, CO, USA
• [Presentation] Novel Resin Mold for UV Nanoimprint: A Demolding Agent Free System (2011)
  • Author(s): M. Shirai
  • Organizer: 37th International Conference on Micro and Nano Engineering
  • Place of Presentation: Berlin, Germany
• [Presentation] UV Imprint Lithography: Process, Materials and Applications (2011)
  • Author(s): M. Shirai
  • Organizer: Korea-Japan Symposium on Frontier Photoscience(招待講演)
  • Place of Presentation: Seoul, Korea
• [Book] 光学用粘・接着剤と貼り合わせ技術 (2012)
  • Author(s): 白井正充
  • Publisher: S&T出版
• [Book] 光学用粘・接着剤と貼り合わせ技術 (2012)
  • Author(s): 白井正充
  • Publisher: Ｓ＆Ｔ出版
• [Book] 高機能アクリル樹脂の開発と応用 (2011)
  • Author(s): 白井正充
  • Publisher: シーエムシー出版
• [Book] 高分子の架橋と分解III (2011)
  • Author(s): 白井正充
  • Publisher: シーエムシー出版
• [Book] 高機能アクリル樹脂の開発と応用 (2011)
  • Author(s): 白井正充 （分担執筆）
  • Total Pages: 10
  • Publisher: シーエムシー
• [Book] 高分子の架橋と分解III (2011)
  • Author(s): 白井正充 （分担執筆）
  • Total Pages: 14
  • Publisher: シーエムシー
• [Remarks]
  • URL: http://www.chem.osakafu-u.ac.jp/ohka/ohka7/index.html