Evaluation of glass thin films by the ultrasonic microspectroscopy technology
| Project/Area Number |
23656260
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| Research Category |
Grant-in-Aid for Challenging Exploratory Research
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| Allocation Type | Multi-year Fund |
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| Research Field |
Measurement engineering
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| Research Institution | Tohoku University |
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Principal Investigator |
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| Co-Investigator(Kenkyū-buntansha) |
ARAKAWA Mototaka 東北大学, 大学院・工学研究科, 助教 (00333865)
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| Project Period (FY) |
2011 – 2012
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| Project Status |
Completed (Fiscal Year 2012)
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| Budget Amount *help |
¥4,030,000 (Direct Cost: ¥3,100,000、Indirect Cost: ¥930,000)
Fiscal Year 2012: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2011: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
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| Keywords | 超音波マイクロスペクトロスコピー技術 / 薄膜 / 音響特性計測 / 不純物 / 欠陥 |
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| Research Abstract |
The ultrasonic microspectroscopy technology was applied to evaluation of glass thin films. Two SiO2/Ta2O5 multilayer films were deposited on SiO2 glass substrates by rf ion beam sputtering, and one of them was annealed. Frequency characteristics of leaky surface acoustic wave (LSAW) velocity were measured for specimens by the line-focus-beam ultrasonic material characterization system, and LSAW velocity changes due to the annealing were detected. TiO2-SiO2 thin films were also deposited on SiO2 glass substrates or TiO2-SiO2 glass substrates, and LSAW velocity changes due to the fictivetemperature changes of films were detected.
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Report
(3 results)
Research Products
(6 results)
