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Film structure modification using high power pulsed magnetron sputtering with target voltage control during pulse-off period

Research Project

Project/Area Number 24560063
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeMulti-year Fund
Section一般
Research Field Applied physics, general
Research InstitutionSeikei University

Principal Investigator

NAKANO Takeo  成蹊大学, 理工学部, 准教授 (40237342)

Project Period (FY) 2012-04-01 – 2015-03-31
Project Status Completed (Fiscal Year 2014)
Budget Amount *help
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2014: ¥1,040,000 (Direct Cost: ¥800,000、Indirect Cost: ¥240,000)
Fiscal Year 2013: ¥2,210,000 (Direct Cost: ¥1,700,000、Indirect Cost: ¥510,000)
Fiscal Year 2012: ¥2,080,000 (Direct Cost: ¥1,600,000、Indirect Cost: ¥480,000)
Keywords大電力パルススパッタリング / プラズマ電位 / 薄膜構造制御 / 微細電子放出源 / 銅薄膜 / 堆積粒子エネルギー / 大電力パルススパッタ / プラズマ電位制御
Outline of Final Research Achievements

In this research, we have studied the control of plasma potential in the High Power Pulsed Magnetron Sputtering (HPPMS) technique. By this, incident energy of ionized species, produced in the high density plasma of HPPMS, to the grounded substrate could be modified, resulting in the densified film structure with flat surfaces. At the beginning of this research, we intended to achieve this by modifying the target voltage waveform, but a more efficient technique, triode HPPMS, has been invented. By applying positive voltage to the third electrode, plasma potential could be controlled during both on and off periods of HPPMS, which extracted full benefits from the ionized plasma. The very flat surface structure could be achieved when Cu films were deposited by this method on water-cooled substrate. It was also found to be efficient for the fabrication of Mo micro emitters, which required normal incidence of depositing species as well as their energy control to suppress the film stress.

Report

(4 results)
  • 2014 Annual Research Report   Final Research Report ( PDF )
  • 2013 Research-status Report
  • 2012 Research-status Report
  • Research Products

    (24 results)

All 2015 2014 2013 Other

All Journal Article (5 results) (of which Peer Reviewed: 5 results,  Open Access: 2 results) Presentation (18 results) (of which Invited: 5 results) Book (1 results)

  • [Journal Article] Fabrication of precious metals recovery materials using grape seed-waste2015

    • Author(s)
      Motoki Inoue, Takeo Nakano, Akihiro Yamasaki
    • Journal Title

      Sust. Mater. Technol.

      Volume: 3 Pages: 14-16

    • DOI

      10.1016/j.susmat.2014.11.005

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Growth of target race track profile during magnetron sputtering2015

    • Author(s)
      Takeo Nakano, Yudai Saitou, Mariko Ueda, Noriaki Itamura, Shigeru Baba
    • Journal Title

      J. Vac. Soc. Jpn.

      Volume: 58

    • NAID

      130005091231

    • Related Report
      2014 Annual Research Report
    • Peer Reviewed / Open Access
  • [Journal Article] Oxygen Incorporation in Reactive-Sputter-Deposited TiN Films: Influence of the Metal to O<sub>2</sub> Gas Flux Ratio2014

    • Author(s)
      Takeo Nakano, Takuya Umahashi, Shigeru Baba
    • Journal Title

      Journal of the Vacuum Society of Japan

      Volume: 57 Issue: 1 Pages: 16-22

    • DOI

      10.3131/jvsj2.57.16

    • NAID

      130004512911

    • ISSN
      1882-2398, 1882-4749
    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Journal Article] Estimation of the pressure‐distance product for thermalization in sputtering for some selected metal atoms by Monte Carlo simulation2014

    • Author(s)
      Takeo Nakano, Shigeru Baba
    • Journal Title

      Japanese Journal of Applied Physics

      Volume: 53 Issue: 3 Pages: 38002-3

    • DOI

      10.7567/jjap.53.038002

    • NAID

      210000143458

    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Journal Article] Effects of Atomic Weight, Gas Pressure, and Target-to-substrate Distance on Deposition Rates in the Sputter Deposition Process2014

    • Author(s)
      Takeo Nakano, Ryo Yamazaki, Shigeru Baba
    • Journal Title

      Journal of the Vacuum Society of Japan

      Volume: 57 Issue: 4 Pages: 152-154

    • DOI

      10.3131/jvsj2.57.152

    • NAID

      130004952507

    • ISSN
      1882-2398, 1882-4749
    • Related Report
      2013 Research-status Report
    • Peer Reviewed
  • [Presentation] 大電力パルススパッタを用いたSpindt 型エミッタ用陰極の形状制御2015

    • Author(s)
      成田智基、木村光佑、板村賢明、中野武雄、長尾昌善、大崎 壽、政岡文平
    • Organizer
      表面技術協会 第131回講演大会
    • Place of Presentation
      関東学院大学 金沢八景キャンパス
    • Year and Date
      2015-03-04
    • Related Report
      2014 Annual Research Report
  • [Presentation] マグネトロンスパッタにおけるエロージョン形状の材料・圧力依存性2015

    • Author(s)
      齋藤悠大、門井裕樹、板村賢明、中野武雄
    • Organizer
      表面技術協会 第131回講演大会
    • Place of Presentation
      関東学院大学 金沢八景キャンパス
    • Year and Date
      2015-03-04
    • Related Report
      2014 Annual Research Report
  • [Presentation] 大電力パルススパッタを用いた薄膜堆積と微小電子源陰極作製2015

    • Author(s)
      中野武雄
    • Organizer
      日本学術振興会 マイクロビームアナリシス第141委員会 第159回研究会
    • Place of Presentation
      成蹊大学吉祥寺キャンパス
    • Year and Date
      2015-02-20
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] 大電力パルススパッタの物理と薄膜構造の制御2014

    • Author(s)
      中野武雄
    • Organizer
      表面技術協会 高機能トライボ表面プロセス部会 第2回例会
    • Place of Presentation
      名城大学 名駅サテライト
    • Year and Date
      2014-12-19
    • Related Report
      2014 Annual Research Report
    • Invited
  • [Presentation] スパッタ成膜速度・膜厚分布のガス圧力・ターゲット-基板間距離依存性(2)2014

    • Author(s)
      山崎 遼、板村賢明、中野武雄
    • Organizer
      第55回真空に関する連合講演会
    • Place of Presentation
      I-site なんば
    • Year and Date
      2014-11-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] マグネトロンスパッタリングにおけるターゲットエロージョン形成の圧力・材料依存性2014

    • Author(s)
      齋藤悠大、門井裕樹、板村賢明、中野武雄
    • Organizer
      第55回真空に関する連合講演会
    • Place of Presentation
      I-site なんば
    • Year and Date
      2014-11-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] 大電力パルススパッタを用いて作製したSpindt型エミッタ用陰極の構造制御2014

    • Author(s)
      木村光佑、成田智基、板村賢明、中野武雄、長尾昌善、大崎 壽、政岡文平
    • Organizer
      第55回真空に関する連合講演会
    • Place of Presentation
      I-site なんば
    • Year and Date
      2014-11-19
    • Related Report
      2014 Annual Research Report
  • [Presentation] Dependence of transport process of sputtered atoms on atom weight, gas pressure and target to substrate distance

    • Author(s)
      Ryo Yamazaki, Takeo Nakano, Shigeru Baba
    • Organizer
      The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013)
    • Place of Presentation
      Kyoto Research Park (Kyoto, Japan)
    • Related Report
      2013 Research-status Report
  • [Presentation] Film structure modification by plasma potential control in triode HPPMS

    • Author(s)
      Takuya Umahashi, Takeo Nakano, Shigeru Baba
    • Organizer
      The 12th International Symposium on Sputtering & Plasma Processes (ISSP2013)
    • Place of Presentation
      Kyoto Research Park (Kyoto, Japan)
    • Related Report
      2013 Research-status Report
  • [Presentation] Film structure modification by plasma potential control in triode HPPMS

    • Author(s)
      Takeo Nakano, Takuya Umahashi, Shigeru Baba
    • Organizer
      19th International Vacuum Congress
    • Place of Presentation
      Palais des Congres (Paris, France)
    • Related Report
      2013 Research-status Report
  • [Presentation] 大電力パルススパッタのイオン化金属粒子を用いた薄膜構造の制御

    • Author(s)
      中野武雄, 馬場 茂
    • Organizer
      第74回応用物理学会秋季学術講演会
    • Place of Presentation
      同志社大
    • Related Report
      2013 Research-status Report
    • Invited
  • [Presentation] 三極スパッタを用いたプラズマ電位制御における電極配置の影響

    • Author(s)
      馬橋琢哉, 中野武雄, 馬場 茂
    • Organizer
      第54回真空に関する連合講演会
    • Place of Presentation
      つくば国際会議場
    • Related Report
      2013 Research-status Report
  • [Presentation] スパッタ成膜速度・膜厚分布のガス圧力・ターゲットー基板配置依存性

    • Author(s)
      山崎 遼, 中野武雄, 馬場 茂
    • Organizer
      第54回真空に関する連合講演会
    • Place of Presentation
      つくば国際会議場
    • Related Report
      2013 Research-status Report
  • [Presentation] スパッタ製膜におけるプラズマ電位制御

    • Author(s)
      中野武雄、馬橋琢哉、馬場 茂
    • Organizer
      第73回応用物理学会学術講演会
    • Place of Presentation
      愛媛大学
    • Related Report
      2012 Research-status Report
  • [Presentation] 大電力パルススパッタとプラズマ電位制御による薄膜構造の変化

    • Author(s)
      中野武雄
    • Organizer
      東京都立産業技術研究センター・表面技術協会三部会合同シンポジウム
    • Place of Presentation
      都立産業技術研究センター
    • Related Report
      2012 Research-status Report
    • Invited
  • [Presentation] プラズマ電位制御用電極を追加した三極スパッタによる銅薄膜構造の変化

    • Author(s)
      馬橋琢哉、中野武雄、馬場 茂
    • Organizer
      第53回真空に関する連合講演会
    • Place of Presentation
      甲南大学ポートアイランドキャンパス
    • Related Report
      2012 Research-status Report
  • [Presentation] スパッタ製膜プロセスにおけるプラズマ電位の計測・制御と薄膜構造への効果

    • Author(s)
      中野武雄
    • Organizer
      真空学会 スパッタリング及びプラズマプロセス技術部会 第132回定例研究会
    • Place of Presentation
      機械振興会館
    • Related Report
      2012 Research-status Report
    • Invited
  • [Presentation] スパッタ製膜におけるプラズマ電位制御(2)

    • Author(s)
      馬橋琢哉、中野武雄、馬場 茂
    • Organizer
      第60回応用物理学会春季学術講演会
    • Place of Presentation
      神奈川工科大学
    • Related Report
      2012 Research-status Report
  • [Book] ドライプロセスによる表面処理・薄膜形成の基礎2013

    • Author(s)
      明石和夫、他17名
    • Total Pages
      208
    • Publisher
      コロナ社
    • Related Report
      2013 Research-status Report

URL: 

Published: 2013-05-31   Modified: 2019-07-29  

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