| Budget Amount *help |
¥5,330,000 (Direct Cost: ¥4,100,000、Indirect Cost: ¥1,230,000)
Fiscal Year 2014: ¥1,170,000 (Direct Cost: ¥900,000、Indirect Cost: ¥270,000)
Fiscal Year 2013: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000)
Fiscal Year 2012: ¥2,600,000 (Direct Cost: ¥2,000,000、Indirect Cost: ¥600,000)
|
|---|
| Outline of Final Research Achievements |
1. Development of new materials for thin film actuator; In this study, Fe-IIIB supersaturated thin film for new magnetrostrictive materials were prepared by ion plating process with dual vapor source. Then discuss the effects of excess energy on thin films nanostructure and solid solubility limit of various solid solution. Excess energy increased with the increase of impinging energy of evaporated particles by rising applied bias voltage and substrate bias voltage. Therefore, excess energy control of ion plating process could be helpful to control solid solubility limit of solid solution.
2. Property Control of thin film actuators; Momentum of ion bombardment in sputtering deposition process, which strongly depends on internal stress of thin films, has been evaluated regarding to a new parameter Pi.. The internal stress of Ni Film changed linearly with the ion bombardment parameter Pi. These results suggest to be useful to control the internal stress of sputtered thin film with the Pi.
|
