Extreme Spatio-temporal Control of Near-field Spectroscopy
Project/Area Number |
24686009
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Research Category |
Grant-in-Aid for Young Scientists (A)
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Allocation Type | Partial Multi-year Fund |
Research Field |
Thin film/Surface and interfacial physical properties
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Research Institution | The Institute of Physical and Chemical Research |
Principal Investigator |
HAYAZAWA NORIHIKO 独立行政法人理化学研究所, その他部局等, 研究員 (90392076)
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Project Period (FY) |
2012-04-01 – 2015-03-31
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Project Status |
Completed (Fiscal Year 2014)
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Budget Amount *help |
¥21,450,000 (Direct Cost: ¥16,500,000、Indirect Cost: ¥4,950,000)
Fiscal Year 2014: ¥1,950,000 (Direct Cost: ¥1,500,000、Indirect Cost: ¥450,000)
Fiscal Year 2013: ¥4,420,000 (Direct Cost: ¥3,400,000、Indirect Cost: ¥1,020,000)
Fiscal Year 2012: ¥15,080,000 (Direct Cost: ¥11,600,000、Indirect Cost: ¥3,480,000)
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Keywords | 走査プローブ顕微鏡 / 光物性 / 非線形 / 超短パルス / ラマン分光 / ナノチューブ / プラズモン / 近接場光学 |
Outline of Final Research Achievements |
I developed a near-field spectroscopy towards extreme spatio-temporal control using visible~near infrared light source. For the extreme temporal resolution, I employed degenerated four wave mixing (FWM), which is one of the third order nonlinear processes. Near infrared broadband pulse is focused onto a near-field probe and I found that a broadband FWM is generated from the tip. By taking the autocorrelation of the generated pulse from the tip, it was found that the pulse has a time duration of ~10fs, which suggested that near-field time-resolved spectroscopy is possible with the nano light source. For the extreme spatial resolution, I developed a home-built scanning tunneling microscope (STM) specifically for near-field spectroscopy. By optimizing environmental condition of the STM, 1.7nm spatial resolution was achieved by STM based tip-enhanced near-field Raman spectroscopy. The achieved spatial resolution is the world highest spatial resolution in optical spectroscopy in ambient.
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Report
(4 results)
Research Products
(55 results)
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[Presentation] Complex nanopatterning induced redistribution of stress in single ultrathin strained silicon nanowires2012
Author(s)
Maria, Vanessam, Valois, Norihiko, Hayazawa, Alvarado, Tarun, Oussama Moutanabbir, Satoshi, Kawata,
Organizer
平成24年度社団法人日本分光学会 年次講演会
Place of Presentation
東京
Year and Date
2012-11-29
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