Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography
| Project/Area Number |
25630424
|
|---|
| Research Category |
Grant-in-Aid for Challenging Exploratory Research
|
| Allocation Type | Multi-year Fund |
|---|
| Research Field |
Nuclear engineering
|
|---|
| Research Institution | Hokkaido University |
|---|
Principal Investigator |
Fujiyoshi Ryoko 北海道大学, 工学(系)研究科(研究院), 准教授 (70229061)
|
|---|
| Co-Investigator(Kenkyū-buntansha) |
OKAMOTO Kazumasa 北海道大学, 大学院工学研究院, 助教 (10437353)
|
|---|
| Project Period (FY) |
2013-04-01 – 2016-03-31
|
| Project Status |
Completed (Fiscal Year 2015)
|
| Budget Amount *help |
¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000)
Fiscal Year 2015: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000)
Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000)
Fiscal Year 2013: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
|
|---|
| Keywords | レジスト / パルスラジオリシス / レーザーフォトリシス / 放射線 / X線 / 粒子線 / 放射線化学 / フッ素化合物 / Ｘ線 / 半導体超微細化 / 電子線 / リソグラフィ / フォトリシス / 放射線、X線、粒子線 / 量子ビーム / 放射線科学 |
|---|
| Outline of Final Research Achievements |
We investigated the new process in which electron beams and laser or Xe lights are irradiated simultaneously or sequentially on to resist materials in order to enhance the sensitivity. We have elucidated the photolysis of radiation-induced intermediates of resist molecules using “Pulse radiolysis-laser photolysis method”. The sensitivity enhancement of resists was also shown using the simultaneous irradiation of electron beams and visible lights from Xe lamp. We have clarified the effectiveness of the new process.
|
Report
(4 results)
Research Products
(27 results)
