Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography

• Project/Area Number: 25630424
• Research Category: Grant-in-Aid for Challenging Exploratory Research
• Allocation Type: Multi-year Fund
• Research Field: Nuclear engineering
• Research Institution: Hokkaido University
• Principal Investigator: Fujiyoshi Ryoko 北海道大学, 工学(系)研究科(研究院), 准教授 (70229061)
• Co-Investigator(Kenkyū-buntansha): OKAMOTO Kazumasa 北海道大学, 大学院工学研究院, 助教 (10437353)
• Project Period (FY): 2013-04-01 – 2016-03-31
• Project Status: Completed (Fiscal Year 2015)
• Budget Amount: ¥3,380,000 (Direct Cost: ¥2,600,000、Indirect Cost: ¥780,000); Fiscal Year 2015: ¥650,000 (Direct Cost: ¥500,000、Indirect Cost: ¥150,000); Fiscal Year 2014: ¥1,300,000 (Direct Cost: ¥1,000,000、Indirect Cost: ¥300,000); Fiscal Year 2013: ¥1,430,000 (Direct Cost: ¥1,100,000、Indirect Cost: ¥330,000)
• Keywords: レジスト / パルスラジオリシス / レーザーフォトリシス / 放射線 / X線 / 粒子線 / 放射線化学 / フッ素化合物 / Ｘ線 / 半導体超微細化 / 電子線 / リソグラフィ / フォトリシス / 放射線、X線、粒子線 / 量子ビーム / 放射線科学

Outline of Final Research Achievements

We investigated the new process in which electron beams and laser or Xe lights are irradiated simultaneously or sequentially on to resist materials in order to enhance the sensitivity. We have elucidated the photolysis of radiation-induced intermediates of resist molecules using “Pulse radiolysis-laser photolysis method”. The sensitivity enhancement of resists was also shown using the simultaneous irradiation of electron beams and visible lights from Xe lamp. We have clarified the effectiveness of the new process.

Research Products

• [Journal Article] Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography (2015)
  • Author(s): N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
  • Journal Title: Proc. SPIE Volume: 9658 Pages: 96581C-96581C
  • DOI: 10.1117/12.2193060
  • Acknowledgement Compliant
• [Journal Article] Pulse Radiolysis Study of Polystyrene-based Polymers with Added Photoacid Generators: Reaction Mechanism of Extreme-ultraviolet and Electron-beam Chemically Amplified Resist (2015)
  • Author(s): Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki
  • Journal Title: Jpn. J. Appl. Phys. Volume: 54 Issue: 2 Pages: 026501-026501
  • DOI: 10.7567/jjap.54.026501
  • NAID: 210000144787
  • Peer Reviewed / Acknowledgement Compliant
• [Journal Article] Fluidity dependence of deprotonation kinetics of chemically amplified resist (2014)
  • Author(s): Kazumasa Okamoto , Takuya Ishida , Hiroki Yamamoto , Takahiro Kozawa , Ryoko Fujiyoshi, and Kikuo Umegaki
  • Journal Title: Proc. SPIE Volume: 9051 Pages: 90511T-90511T
  • DOI: 10.1117/12.2046057
  • Peer Reviewed
• [Journal Article] Deprotonation mechanism of ionized poly(4-hydroxystyrene) (2014)
  • Author(s): Toshihiko Susa, Kazumasa Okamoto , Takuya Ishida , Hiroki Yamamoto , Takahiro Kozawa , Ryoko Fujiyoshi, and Kikuo Umegaki
  • Journal Title: Proc. SPIE Volume: 9051 Pages: 90511O-90511O
  • DOI: 10.1117/12.2045881
  • Peer Reviewed
• [Journal Article] Deprotonation of poly(4-hydroxystyrene) intermediates: pulse radiolysis study of EUV and electron beam resist (2013)
  • Author(s): Kazumasa Okamoto, Tyo Matsuda, Hiroki Yamamoto, Takahiro Kozawa, Seiichi Tagawa, Ryoko Fujiyoshi, and Takashi Sumiyoshi
  • Journal Title: Jpn. J. Appl. Phys. Volume: 52 Issue: 6S Pages: 06GC04-06GC04
  • DOI: 10.7567/jjap.52.06gc04
  • Peer Reviewed
• [Presentation] Radiation-induced reaction of fluorinated polymers and related compounds for extreme-ultraviolet lithography (2015)
  • Author(s): N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
  • Organizer: Pacifichem 2015
  • Place of Presentation: ホノルルコンベンションセンター（ハワイ）
  • Year and Date: 2015-12-15
  • Int'l Joint Research
• [Presentation] Pulse radiolysis study of resist polymers with and without photoacid generator (2015)
  • Author(s): K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
  • Organizer: Pacifichem 2015
  • Place of Presentation: ホノルルコンベンションセンター（ハワイ）
  • Year and Date: 2015-12-15
  • Int'l Joint Research
• [Presentation] Radiation chemistry of fluorinated polymers for Extreme-ultraviolet resist (2015)
  • Author(s): N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
  • Organizer: MNC2015
  • Place of Presentation: 富山国際会議場（富山県富山市）
  • Year and Date: 2015-11-10
  • Int'l Joint Research
• [Presentation] Pulse radiolysis in concentrated poly(4-hydroxystyrene) solution: Acid generation dynamics in EUV and electron-beam chemically amplified resist (2015)
  • Author(s): K. Okamoto, T. Ishida, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
  • Organizer: MNC2015
  • Place of Presentation: 富山国際会議場（富山県富山市）
  • Year and Date: 2015-11-10
  • Int'l Joint Research
• [Presentation] パルスラジオリシス法によるフッ素樹脂の放射線化学反応の解明 (2015)
  • Author(s): 野村直矢、岡本一将、藤吉亮子、梅垣菊男、山本洋揮、古澤孝弘
  • Organizer: 日本原子力学会２０１５年秋の大会
  • Place of Presentation: 静岡大学静岡キャンパス（静岡県静岡市）
  • Year and Date: 2015-09-09
• [Presentation] Dynamics of radical ions of fluorinated polymer for Extreme Ultraviolet (EUV) lithography (2015)
  • Author(s): N. Nomura, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, K. Umegaki
  • Organizer: Photomask Japan 2015
  • Place of Presentation: パシフィコ横浜（神奈川県横浜市）
  • Year and Date: 2015-04-20
  • Int'l Joint Research
• [Presentation] EUVレジストに向けたフッ素ポリマーの放射線化学反応の解明 (2015)
  • Author(s): 野村直矢、岡本一将、藤吉亮子、梅垣菊男、山本洋揮、古澤孝弘
  • Organizer: 日本原子力学会 ２０１５年春の年会
  • Place of Presentation: 茨城大学日立キャンパス、日立
  • Year and Date: 2015-03-22
• [Presentation] 光酸発生剤を添加した芳香族系レジスト樹脂のパルスラジオリシス (2015)
  • Author(s): 岡本一将、石田拓也、藤吉亮子、梅垣菊男、山本洋揮、古澤孝弘
  • Organizer: 日本原子力学会 ２０１５年春の年会
  • Place of Presentation: 茨城大学日立キャンパス、日立
  • Year and Date: 2015-03-22
• [Presentation] Radiation Chemistry of Fluorinated Polymers for Extreme Ultraviolet Resist (2014)
  • Author(s): Naoya Nomura, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki,
  • Organizer: MNC2014
  • Place of Presentation: Hilton FukuokaSea Hawk,福岡
  • Year and Date: 2014-11-04 – 2014-11-07
• [Presentation] Pulse Radiolysis Study of EUV Resist Polymers with Photoacid Generator (2014)
  • Author(s): Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki
  • Organizer: APSRC2014
  • Place of Presentation: 東京大学、東京
  • Year and Date: 2014-09-08 – 2014-09-11
• [Presentation] Radiation Chemistry of Fluorinated Polymers for Extreme-ultraviolet Resist (2014)
  • Author(s): Naoya Nomura, Kazumasa Okamoto, Hiroki Yamamoto, Takahiro Kozawa, Ryoko Fujiyoshi, Kikuo Umegaki
  • Organizer: APSRC2014
  • Place of Presentation: 東京大学、東京
  • Year and Date: 2014-09-08 – 2014-09-11
• [Presentation] Acid Generation Mechanism in Solid Poly(4-hydroxystyrene) upon Exposeure to Electron Beam (2013)
  • Author(s): H. Yamamoto, K. Okamoto, and T. Kozawa
  • Organizer: MNC2013
  • Place of Presentation: ロイトン札幌、札幌市
• [Presentation] Viscosity Effect on Deprotonation Dynamics of Poly(4-hydroxystyrene) (2013)
  • Author(s): T. Ishida, K. Okamoto, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and T. Sumiyoshi
  • Organizer: MNC2013
  • Place of Presentation: ロイトン札幌、札幌市
• [Presentation] Pulse Radiolysis Study of Polystyrene-based Polymers with Adding Photoacid Generators (PAGs): Molecular Dynamics of Extreme-ultraviolet and Electron Beam Resist (2013)
  • Author(s): K. Okamoto, K. Tominaga, T. Hori, H. Yamamoto, T. Kozawa, R. Fujiyoshi, and T. Sumiyoshi
  • Organizer: MNC2013
  • Place of Presentation: ロイトン札幌、札幌市
• [Presentation] ポリ(4-ヒドロキシスチレン)のラジカルカチオンの脱プロトン反応 (2013)
  • Author(s): 須佐俊彦、岡本一将、石田拓也、山本洋揮、古澤孝弘、藤吉亮子、住吉 孝
  • Organizer: 第56回放射線化学討論会
  • Place of Presentation: 広島大学、広島市
• [Presentation] 化学増幅レジストモデルのパルスラジオリシス (2013)
  • Author(s): 岡本一将、山本洋揮、古澤孝弘、藤吉亮子、住吉 孝
  • Organizer: 第56回放射線化学討論会
  • Place of Presentation: 広島大学、広島市
• [Presentation] ポリ(4-ヒドロキシスチレン)(PHS)濃厚溶液の脱プロトン反応の粘度効果 (2013)
  • Author(s): 石田拓也、岡本一将、山本洋揮、古澤孝弘、藤吉亮子、住吉 孝
  • Organizer: 第56回放射線化学討論会
  • Place of Presentation: 広島大学、広島市
• [Presentation] ポリ（4-ヒドロキシスチレン）（PHS）濃厚溶液の脱プロトン反応の粘度効果
  • Author(s): 石田拓也、岡本一将、山本洋揮、古澤孝弘、藤吉亮子、梅垣菊男
  • Organizer: 日本原子力学会 ２０１４年春の年会
  • Place of Presentation: 東京都市大学世田谷キャンパス
• [Presentation] パルスラジオリシスによるポリヒドロキシスチレン固体中での 脱プロトン化反応に関する研究
  • Author(s): 山本洋揮、岡本一将、古澤孝弘
  • Organizer: 第61 回応用物理学会春季学術講演会
  • Place of Presentation: 青山大学相模原キャンパス
• [Presentation] Fluidity dependence of deprotonation kinetics of chemically amplified resist
  • Author(s): Kazumasa Okamoto , Takuya Ishida , Hiroki Yamamoto , Takahiro Kozawa , Ryoko Fujiyoshi , Kikuo Umegaki
  • Organizer: SPIE Advanced Lithography 2014
  • Place of Presentation: San Jose Marriott and San Jose Convention Center, San Jose, California, U.S.A.
• [Presentation] Deprotonation mechanism of ionized poly(4-hydroxystyrene)
  • Author(s): Toshihiko Susa, Kazumasa Okamoto , Takuya Ishida , Hiroki Yamamoto , Takahiro Kozawa , Ryoko Fujiyoshi , Kikuo Umegaki
  • Organizer: SPIE Advanced Lithography 2014
  • Place of Presentation: San Jose Marriott and San Jose Convention Center, San Jose, California, U.S.A.
• [Presentation] 高密度イオン化状態におけるＥＵＶリソグラフィプロセスのシミュレーション
  • Author(s): 西野圭一郎、 岡本一将、 古澤孝弘、 藤吉亮子、 梅垣菊男
  • Organizer: 日本原子力学会北海道支部第３０回研究発表会
  • Place of Presentation: 北海道大学、札幌市