On-Machine Polishing Phenomena Observation Apparatus Development and Its Phenomenon Analysis

• Project/Area Number: 25870514
• Research Category: Grant-in-Aid for Young Scientists (B)
• Allocation Type: Multi-year Fund
• Research Field: Production engineering/Processing studies; Design engineering/Machine functional elements/Tribology
• Research Institution: Kyushu Institute of Technology
• Principal Investigator: KHAJORNRUNGRUANG Panart 九州工業大学, 情報工学研究院, 助教 (60404092)
• Research Collaborator: KIMURA Keiichi 九州工業大学, 大学院情報工学研究院, 教授 (80380723) ; BABU Suryadevara V. クラークソン大学(米国), Dept. of Chemical & Biomolecular Engineering, Distinguished University Professor(栄誉教授) ; SUZUKI Keisuke 九州工業大学, 大学院情報工学研究院, 准教授 (50585156)
• Project Period (FY): 2013-04-01 – 2015-03-31
• Project Status: Completed (Fiscal Year 2014)
• Budget Amount: ¥4,290,000 (Direct Cost: ¥3,300,000、Indirect Cost: ¥990,000); Fiscal Year 2014: ¥1,560,000 (Direct Cost: ¥1,200,000、Indirect Cost: ¥360,000); Fiscal Year 2013: ¥2,730,000 (Direct Cost: ¥2,100,000、Indirect Cost: ¥630,000)
• Keywords: polishing phenomena / nanoparticle / scattering light / SiC / optical microscopy / evanescent wave / laser / visualization / particle / polishing / evanescent / near field / scattering / surface / 国際研究者交流（米国） / ナノ粒子 / エバネッセント / レーザ / 近接場 / 微粒子 / 散乱 / 界面

Outline of Final Research Achievements

This study proposes the concept and a state-of-art compact and mobile apparatus for dynamically observing sub 50 nm-sized moving particles on the surface being polished by using an evanescent field, in purpose to apply for investigating polishing phenomena. By this method, only the particle near the surface can be visualized due to the limited range of the localized evanescent field. Therefore, an observed image of scattering light from each nano-particle, not an image of the particle, will have high contrast since there is no scattering light from other particles that are out of the evanescent field.

The developed mobile apparatus approximately has 350 mm long, 150 mm high, 100 mm wide in dimensions and 15.7 N in weight. The scattering light from moving nanoparticles in polishing can be dynamically (up to 100 frame/s) observed down to 15 nm (down to 50 nm for moving particles on 4H-SiC surface) with the developed compact and mobile apparatus.

Research Products

• [Journal Article] Study on Dynamic Observation of sub-50 nm sized particles in Water Using Evanescent Field with a Compact and Mobile Apparatus (2014)
  • Author(s): Khajornrungruang, P.; Dean, P. J.; Babu, S. V.
  • Journal Title: Proceedings of Annual Meeting of the American Society for Precision Engineering, ISBN: 978-1-887706-66-7 Volume: 29 Pages: 73-77
  • Peer Reviewed / Acknowledgement Compliant
• [Presentation] エバネッセント光を用いたナノ微粒子観察によるポリシング加工の現象解析 (2015)
  • Author(s): 今井祐太，鈴木恵友，カチョーンルンルアン パナート
  • Organizer: 日本機械学会 九州支部 第68期総会・講演会
  • Place of Presentation: 福岡大学，福岡県
  • Year and Date: 2015-03-13
• [Presentation] Study on Dynamic Observation of sub-50 nm sized particles in Water Using Evanescent Field with a Compact and Mobile Apparatus（口頭） (2014)
  • Author(s): Panart Khajornrungruang, Patrick J. Dean, S. V. Babu
  • Organizer: the 29th ASPE Annual Meeting
  • Place of Presentation: Boston, Nassachusetts, USA
  • Year and Date: 2014-11-09 – 2014-11-14
• [Presentation] Study on sub 50 nm sized particle dynamic observation in water using evanescent field with mobile apparatus (2014)
  • Author(s): Panart Khajornrungruang, Patrick J. Dean, S. V. Babu
  • Organizer: 29th Annual Meeting of the American Society for Precision Engineering
  • Place of Presentation: Boston, Massachusetts USA
• [Presentation] Nano-sized Particles Detection and Analysis in Solution using Evanescent Field (2013)
  • Author(s): Panart Khajornrungruang, Sevim Korkmas, S. V. Babu
  • Organizer: 18th International Symposium on Chemical-Mechanical Planarization
  • Place of Presentation: Lake Placid, NY