薄膜形成プロセスにおけるコンピュータ支援反応系設計法の確立

• Project/Area Number: 98J04103
• Research Category: Grant-in-Aid for JSPS Fellows
• Allocation Type: Single-year Grants
• Section: 国内
• Research Field: Electronic materials/Electric materials
• Research Institution: The University of Tokyo
• Principal Investigator: 高橋 崇宏
• Project Period (FY): 1998 – 1999
• Project Status: Completed (Fiscal Year 1999)
• Budget Amount: ¥2,400,000 (Direct Cost: ¥2,400,000); Fiscal Year 1999: ¥1,200,000 (Direct Cost: ¥1,200,000); Fiscal Year 1998: ¥1,200,000 (Direct Cost: ¥1,200,000)