濃度分布を高精度で測定するための高周波バック・スパッタリング法の開発と薄膜拡散研究への応用

• Project/Area Number: X00120----085026
• Research Category: Grant-in-Aid for Developmental Scientific Research
• Allocation Type: Single-year Grants
• Research Field: Physical properties of metals
• Research Institution: Tohoku University
• Principal Investigator: 平野 賢一 東北大, 工, 教授
• Project Period (FY): 1975 – 1976
• Project Status: Completed (Fiscal Year 1976)
• Budget Amount: ¥3,000,000 (Direct Cost: ¥3,000,000); Fiscal Year 1976: ¥1,000,000 (Direct Cost: ¥1,000,000); Fiscal Year 1975: ¥2,000,000 (Direct Cost: ¥2,000,000)