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濃度分布を高精度で測定するための高周波バック・スパッタリング法の開発と薄膜拡散研究への応用

Research Project

Project/Area Number X00120----085026
Research Category

Grant-in-Aid for Developmental Scientific Research

Allocation TypeSingle-year Grants
Research Field Physical properties of metals
Research InstitutionTohoku University

Principal Investigator

平野 賢一  東北大, 工, 教授

Project Period (FY) 1975 – 1976
Project Status Completed (Fiscal Year 1976)
Budget Amount *help
¥3,000,000 (Direct Cost: ¥3,000,000)
Fiscal Year 1976: ¥1,000,000 (Direct Cost: ¥1,000,000)
Fiscal Year 1975: ¥2,000,000 (Direct Cost: ¥2,000,000)

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Published: 1987-03-31   Modified: 2016-04-21  

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