| 研究実績の概要 |
In the previous year, the milestones set in the research plan has been acheived and published in academic journals. A highly repeatable, stable, and a reliable fabrication process for fabricating graphene nanoribbon(GNR) structures of ribbon width less than 70-nm has been established. Using this process methodology, GNR of width 30-nm can be patterned and structured on a device with stable electronic performance. The photonic properties of this device was tested under a solar simulator and two different wavelength of lights focused from a laser beam. When tested under a light beam of 532-nm, the device responded with a photonic responsivity of 5.5x10^3 (A/W) which is comparable and even larger than several graphene and GNR based devices in current literature. Secondly, the concept of controlling and further enhancing the electronic band properties of graphene nanoribbons by applied mechanical stress has also been tested and validated experimentally. The data showed a very high gauge factor of 1,500 under mechanical strain, which is also exceptionally larger than several metallic strain gauges. The concepts tested and validated in this research proves the feasibility of GNR structures application to high performing semiconductor devices. The data has been published in highly ranked academic journals and presented in two international conferences, in Japan and Portugal. In addition, the paper presented in Japan has received IEEE EPS Japan Chapter Award.
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