| 研究開始時の研究の概要 |
Transmission electron microscopy has become ubiquitous in materials science, because of its ability to perform atomic-scale characterization of a wide variety of samples.
Under ideal conditions, the best electron microscopes can routinely achieve resolutions below 50pm. However, most materials are damaged by the high-energy electron beam. Therefore, the resolution of the images depends on the irradiation dose that the sample can tolerate.
The aim of this project is to create a new intelligent acquisition method for electron microscopy images which will significantly reduce the electron dose.
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