-
[文献書誌] H.Kanoh: "Low-Temperature Chemical-Yapor-Deposition of Silicon Nitride" Journal de Physique IV. 1. 831-837 (1991)
-
[文献書誌] T.Hattori: "Chemical Structure of Ultrathin Silicon Oxide Films and The Oxide-Silicon Interface" Thin Solid Films. 206. 1-5 (1991)
-
[文献書誌] N.Terada: "Effect of Silicon Wafer In-situ Cleaning on the Chemical Structureof Ultrathin Silicon Oxide Film" Japanese Journal of Applied Physics. 30. 3584-3589 (1991)
-
[文献書誌] N.Terada: "Silicon-Silicon Bonds is The Oxide Near The SiO_2/Si Interface" accepted for publication in Applied Surface Science.
-
[文献書誌] H.Ogawa: "Silicon-Hydrogen Bonds in Silicon Oxide Near The SiO_2/Si Interface" accepted for publication in Applied Surface Science.
-
[文献書誌] T.Hattori: "Initial Stage of SiO_2/Si Interface Formation on Si(111) Surface" accepted for publication in Japanese Journal of Applied Pyhsics.
-
[文献書誌] 服部 健雄: "日本学術振興会 結晶加工と評価技術第145委員会編「表面界面の超精密創成・評価技術」第II篇第2章第II節 表面の自然酸化物" (株)サイエンスフォ-ラム, (1991)
-
[文献書誌] 服部 健雄: "表面科学会編 日本表面科学会創立10周年記念「表面科学の基礎と応用」応用編第3章第5節 絶縁体/半導体界面" (株)NTS, (1991)