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[文献書誌] T.Hara,H.Hagiwara: "“Monitoring of Dose in Low Dose lon Implantation"," Nuclear Instruments and Methods in Physics Research,. B55. 250-252 (1991)
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[文献書誌] M.Furukawa T.Hara: "“Plasma Damage lnduced on Silicon Surface in a Barrel Asher"" J.Electrochem.Soc.138. 542-544 (1991)
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[文献書誌] T.Hara T.Miyamoto: "“In Situ Stress Measurement of Tungsten Silicide"," Appl.Phys.Lett.58(13). 1425-1427 (1991)
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[文献書誌] T.Hara J.Hiyoshi: "Damage Formed by Electron Cyclotron Reトonance Plasma Etching on Silicon Surface"" Japan J.Appl.Phys.30(5). 1045-1049 (1991)
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[文献書誌] T.Hara G.washidzu: "Dose and Damage Measurements in Low Dose Ion Implantation in Silicon by Photoーacoustic Displacement and Minority Carrier Lifetime" Japan J.Appl.Phys.30(6). 1025-1027 (1991)
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[文献書誌] T.Hara,A.Yamanoue: "Properties of Titanium Nitride Films for Barrier Metal in Aluminum Ohmic Contact Systems"" Japan J.Applied Phys.30(7). 1447-1451 (1991)
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[文献書誌] M.Sato,D.Kimura.: "Suppression of Damage in Magnetron Enhanced Reactive Ion Etching"" Electrochemical Society,. (1991)
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[文献書誌] M.Sato,D.Kimura: "Low Damage Magnetron Enhanced Reactive Ion Etching" International Solid State Devices and Materials Conf.23. (1991)
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[文献書誌] T.Hara,K.Kinoshita: "Reflectivity and Ellipsometric Measurements" Intern.Conf.Materials and Phys. 2. 209-212 (1991)
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[文献書誌] T.Hara,H.Suzuki,: "Thermal Wave Measurements for Preamorphized Si" MRS Fall Meeting,. (1991)