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[文献書誌] S.Miyazaki,Y.Kiriki,Y.Inoue and M.Hirose: "Radical and Ion Induced Surface Reactions in Plasma Enhanced CVD of Si." Proc.of Dry Process Symp.17-22 (1990)
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[文献書誌] 宮崎 誠一、広瀬 全孝: "プロセス用プラズマの制御の最前線" 電気学会誌. 110. 189-193 (1990)
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[文献書誌] S.Iseda,K.Asami,H.Sakaue and Y.Horiike: "Digital Etching of Silicon" Digest of Papers 1990 3rd MicroProcess Conference.112-113 (1990)
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[文献書誌] H.Sakaue,S.Iseda,K.Asami,J.Yamamoto,M.Hirose and Y.Horiike: "Atomic Layer Controlled Digital Etching of Silicon." Jpn.J.Appl.Phys.2648-2652 (1990)
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[文献書誌] S.Miyazaki,Y.Kiriki,Y.Inoue and M.Hirose: "Radical and Ion Induced Reactions on Plasma Deposited Silicon Surfaces." Jpn.J.Appl.Phys.(1991)
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[文献書誌] H.Shin,S.Miyazaki,H.Ichihashi and M.Hirose: "A.New Deposition Mode in PlasmaーEnhanced Cryogenic CVD" J.NonーCryst.Solids.(1991)
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[文献書誌] S.Shougen,M.Kawasaki,Y.Matsumi,I.Toyoshima and H.Okabe: "Pyrolytic and Photolytic Dissociation of Trimethylgallium on Si,Al and Au Substrates." J.Appl.Phys.(1991)
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[文献書誌] M.Kawasaki and N.Nishi: "Laser Photodissociation of Organometallic Compounds on a Cryosubstrate." Appl.Organomet.Chem.(1991)
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[文献書誌] Y.Matsumi,M.Kawasaki,S.Shougen and I.Toyoshima: "Pyrolytic and Photolytic Dissociation of Trimethylgallium on Si,Au,and AlSubstrates" Extended Abstracts of the 22nd Conf.on Solid State Devices and Materials 1990.885-888 (1990)
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[文献書誌] I.Suemune,A.Kishimoto,K.Hamaoka,Y.Honda,Y.Kan and M.Yamanishi: "Dependence of GaAs Etch Rate on the Angle of Incidence of a Hydrogen Plasma Beam Excited Electron Cyclotron Resonance." Appl.Phys.Lett.56. 2393-2395 (1990)
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[文献書誌] A.Kishimoto,I.Suemune,K.Hamaoka,T.Koui,Y.Honda and M.Yamanishi: "InーSitu RHEED Monitoring of Hydrogen Plasma Cleaning on Semiconductor Surfaces." Jpn.J.Appl.Phys.29. 2273-2276 (1990)
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[文献書誌] I.Suemune,K.Hamaoka,A.Kishimoto,T.Koui.Y.Honda and M.Yamanishi: "HydrogenーPlasma Photo Effects on MetalーOrganic Molecular Beam Epitaxy of GaAs." J.Crystal Growth. (1991)