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[文献書誌] Y.Hikosaka,M.Nakamura,H.Sugai: "Free Radicals in an Inductively Coupled Etching Plasma" Japanese Journal of Applied Physics. 33. 2157-2163 (1994)
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[文献書誌] H.Sugai,K.Nakamura,K.Suzuki: "Electrostatic Coupling of Antenna and the Shieding Effect in Inductive RFPlasmas" Japanese Journal Applied Physics. 33. 2189-2193 (1994)
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[文献書誌] 菅井秀郎: "低圧力・高密度プラズマの新しい展開" 応用物理. 63. 559-567 (1994)
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[文献書誌] K.Nakamura,T.Imura,H.Sugai.M.Ohkubo,K.Ichihara: "High-Speed Etching of Indium-Tin-Oxide Thin Films using an Inductively Coupled Plasma" Japanese Journal Applied Physics. 33. 4438-4441 (1994)
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[文献書誌] S.Ito,K.Nakamura,H.Suga: "Radical Control by Wall Heating of a Fluorocarbon Etching Reactor" Japanese Journal of Applied Physics. 33. L1261-L1265 (1994)