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[文献書誌] M.Akazawa,H.Hasegawa,H.Tomozawa and H.Fujikura: "Reappraisal of Si-Interlayer-Induced Change of Band Discontinuity at GaAs-AlAs HeterointerfaceTaking Account of Delta-Doping" Jpn.J.Appl.Phys.Vol.31. L1012-L1014 (1992)
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[文献書誌] M.Akazawa,H.Hasegawa,H.Tomozawa and H.Fujikura: "Investigation of valence band offset modification at GaAs-AlAs and InGaAs-InAlAs heterointerfaces by a Si interlayer" Proc.of 19th Int.Symp.GaAs and Related Compounds(Karuizawa,Japan,28 September-2 October). 253-256 (1993)
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[文献書誌] S.Kodama,M.Akazawa,H.Fujikura and H.Hasegawa: "Interface Profile Optimization in Novel Surface Passivation Scheme for InGaAs Nanostures Using Si Interface Control Layer" Journal of Electronic Materials. Vol.22. 289-295 (1993)
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[文献書誌] S.Suzuki,Y.G.Xie,T.Sawada and H.Hasegawa: "Application of Sillicon Interface Control Layer Technique to Fabrication of InGaAs Metal-Insulator-Semiconductor FETs" Proc.of 1st Int.Symp.Control of Semiconductor Interfaces(Karuizawa,Japan). (to be published.). (1994)
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[文献書誌] S.Kodama and H.Hasegawa: "Control of Sillicon Nitride-In0.53 Ga0.47 As Interface by Ultrahin Sillicon Interface Control Layer" Proc.of 1st Int.Symp.Control of Semiconductor Interfaces(Karuizawa,Japan). (to be published.). (1994)