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[文献書誌] Tadahiro Ohmi: "Dual-Frequency-Excitation Plasma for Perfect Parameter Controlled Advanced Semiconductor Processing" The Second International Symposium on Sputtering & Plasma Processes. 123-126 (1993)
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[文献書誌] Masaki Hirayama,Wataru Shindo and Tadahiro Ohmi: "Impact of High-Precision RF-Plasma Control on Very-Low-Temperature Silicon Epitaxy" International Conference on Solid State Devices and Materials. 210-212 (1993)
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[文献書誌] Hiroaki Uetake,Gang Su Jong,and Tadahiro Ohmi: "Proposal for Equipment Standardization by Dual-Frequency-Excitation Plasma Processing" International Conference on Solid State Devices and Materials. 591-593 (1993)
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[文献書誌] K.Ino,I.Natori,A.Ichikawa and T.Ohmi: "In Situ Chamber Cleaning Using Halogenated-Gas-Plasmas Evaluated by Plasma-Parameter Extraction" Japanese Journal of Applied Physics. 33. 505-509 (1994)
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[文献書誌] R.N.Vrtis,A.Ichikawa,K.Ino,and T.Ohmi: "In-Situ Chamber Cleaning:Optimizing Cleaning Gas and Chamber Material" 185th Electrochemical Society Meeting. (1994年5月発表予定).