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[文献書誌] H.Shin,M.Hashimoto,K.Okamoto,S.Miyazaki and M.Hirose: "High-Fluidity Deposition of Silicon by Plasma-Enhanced Chemical Vapor Deposition Using Si_2H_6 or SiH_4" Japanese Journal of Applied Physics. 32. 3081-3084 (1993)
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[文献書誌] S.Sugita,T.Abe,and K.Itaya: "Electrochemical Scanning Tunneling Microscopy of Silver Adlayers on Iodine Coated Au(111)in Perchloric Acid Solution" Appl.Phys.Lett.97. 8780-8785 (1993)
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[文献書誌] G.Ganguly and A.Matsuda: "Defect Formation During Growth of Hydrogenated Amorphous Silicon" Phys.Rev.B. 47. 91-96 (1993)
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[文献書誌] K Nakamura,T.Akasaka,K.Araki,H.Ishida,I.Shimizu: "Structural relaxation in Si network induced by atomic hydrogen under observation with in situ ellipsometry" J.Non-Cryst.Solids. (印刷中). (1993)
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[文献書誌] M.Azuma,T.Yokoi,I.Shi-iya,and I.Shimizu: "Stable a-Si:H fablicated from halogenous silane by ECR hydrogen plasma" J.Non-Cryst.Solids. (印刷中). (1993)
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[文献書誌] M.Otobe,M.Kimura,S.Oda: "Selective Etching of Hydrogenated Amorphous Silicon by Hydrogen Plasma" Japanese Journal of Applied Physics. (印刷中). (1994)