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[文献書誌] J. Choi: "Application of Deep Reactive Ion Etching for Silicon Angular Rate Sensor" Microsystem Technologies. 2, 4. 186-199 (1996)
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[文献書誌] J, Mizuno: "Fabrications and Characterization of a Silicon Capacitive Structure for Simultanious Detection of Acceleration and Angular Rate" Sensors and Actuators. A, 54. 646-650 (1996)
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[文献書誌] P. J. French: "Electrocheical Etch-Stop in TMAH without External Applied Bias" Sensors and Actuators. A, 56. 279-280 (1996)
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[文献書誌] T. Mineta: "Three-axis Capacitive Accelerometer with Uniform Axial Sensitivities" J of Micromechanics and Microengineering. 6, 4. 431-435 (1996)
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[文献書誌] 南和幸: "封止されたマイクロメカニカルデバイスのダンピング制御" 電気学会論文誌E. 117-E, 2. 109-116 (1997)
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[文献書誌] M. Esashi: "Silicon Resonant Sensors by Micromachining" Therd International Conf. on Motion and Vibration Control. 3. 194-199 (1996)
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[文献書誌] S. Gon: "Fabrication of Reactive Ion Etching Systems for Deep Silicon Machining" Technical Digest of the 14th Sensor Symposium. 14. 183-186 (1996)
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[文献書誌] M. Yamashita: "A Silicon Micromachined Resonant Angular Rate Sensor Using Electrostatic Exitation and Capacitive Detection" Technical Digest of the 14th Sensor Symposium. 14. 39-42 (1996)
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[文献書誌] T. Murakoshi: "Preliminary Study on Electrostatically Levitating Inertia Measurement System" Technical Digest of the 14th Sensor Symposium. 14. 47-50 (1996)
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[文献書誌] R. Toda: "Study of Xenon Difluoride Silicon Etch for Thin Beam Bulk Micromachining" Technical Digest of the 14th Sensor Symposium. 14. 175-178 (1996)
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[文献書誌] 村越尊雄: "静電浮上型慣性計測システムの基礎研究" 電気学会研究会資料. PS-96-11. 43-52 (1996)
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