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[文献書誌] H. Kohno: "Destruction of volatile organic compounds used in a semiconductor industry by a capillary tube discharge reactor"IEEE TRANS. ON INDUSTRY APPLICATIONS. 30(5). 935-966 (1998)
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[文献書誌] C. P. Lungu: "Fluorinated carbon films with low dielectric constant made from novel fluorocarbon source materials by RF plasma enhanced chemical vapor deposition"Jpn. J. Appl. Phys.. 38(12B). L1544-L1546 (1999)
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[文献書誌] C. P. Lungu: "CxFy polymer film deposition in DC and RF fluorinert vapor plasmas"The Second International Symposium on Applied Plasma Sciences, Osaka, Japan, September 20-24, 1999. 253-260 (1999)
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[文献書誌] C. P. Lungu: "DC and RF fluorocarbon (C_7F_<16>) discharges and CFx film deposition"電気学会基礎・材料・共通部門大会論文集. 191-196 (1999)
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[文献書誌] C. P. Lungu: "Spatial and temporal distribution of species in a plasma excited by dc discharge and UV irradiation"The XXIV International Conference on Phenomena in Ionized Gases, Warsaw, Poland, July 11-16. 97-98 (1999)
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[文献書誌] C. P. Lungu: "Decomposition of fluorocarbon polymer films in plasma excited by dc discharge and UV irradiation"The XXIV International Conference on Phenomena in Ionized Gases, Warsaw, Poland, July 11-16. 43-44 (1999)
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[文献書誌] C. P. Lungu: "C_7F_<16> decomposition in low temperature plasma excited by dc discharge and UV irradiation"平成11年春季第46回応用物理学会全国大会. 30p-G-8 (1999)
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[文献書誌] A. Oda: "1-dimensional modeling of low frequency and high-pressure Xe barrier discharges for design of excimer lamps"J. Phys. D : Appl. Physics. 32(21). 2726-2736 (1999)
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[文献書誌] C. P. Lungu: "CxFy polymer film deposition in DC and RF fluorinert vapor plasmas"Vacuum(発表予定). (2000)