-
[文献書誌] 今井健一郎: "ETチップを用いた加工における超音波振動の効果"ABTEC(Abrasive Technology)2000. 279-280 (2000)
-
[文献書誌] H.Hashimoto,: "Ultrasonic Shear-mode Machining with a Newly Developed Engineered Tool Chip"ICPMT2000(5th International Conference on Progress of Machining Technology). (to be published). (2001)
-
[文献書誌] Y.Ogita: "PCA characterization of residual subsurface damage after silicon wafer mirror and its removal"Materials Ressearch Society Proc.Chemical Mechanical Polishing-Fundamental and Challenges . 566. 261-266 (2000)
-
[文献書誌] Y.Ogita: "Photocondsuctivity characterization of silicon wafer mirror-polishing subsurface damage related to gate oxide integrity"Journal of Crystal Growth. 210. 36-39 (2000)
-
[文献書誌] 黒川昌毅: "Si表面層H^+イオン注入ダメージの光導電評価とGOI"神奈川工科大学研究報告B理工学編. 24. 45-51 (2000)
-
[文献書誌] 佐々木謙孝: "電子ビームによるシリコン表面層のトモグラフィの検討"神奈川工科大学研究報告B理工学編. 24. 57-61 (2000)
-
[文献書誌] Y.Ogita: "Subsurface damage characterization of hydrogen ion implanted wafer with UV/millimeter-wave technique"Materials Research Society Proc.Millimeter//Submillimeter-Wave Technology-Materials, Devices, and Diagnostics. 631. AA1.8.1-AA1.8.6 (2001)
-
[文献書誌] Y.Ogita: "Silicon wafer subsurface characterization with UV/millimeter-wave technique"Materials Research Society Proc.Millimeter/Submillimeter-Wave Technology-Materials, Devices, and Diagnostics. 631. AA2.5.1-AA2.5.6 (2001)
-
[文献書誌] T.Katoh: "Subsurface damage profile characterization of Si wafers with UV/millimeter-wave techniques and light scattering"Materials Research Society Proc.Millimeter/Submillimeter-Wave Technology-Materials, Devices, and Diagnositics. 631. AA1.9.1-AA1.9.6 (2001)
-
[文献書誌] 荻田陽一郎.: "UV/ミリ波PCD法における最大感度条件とSiエピタキシャルウェーハおよび極表面層評価"神奈川工科大学B理工学編. 25. 29-33 (2001)