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[文献書誌] Y.Ueda,H.Muta and Y.Kawai: "Role of peripheral vacuum regions in the control of the electron cyclotron resonance plasma uniformity"Applied Physics Letters. 74,14. 1972-1974 (1999)
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[文献書誌] M.Shindo,S.Hiejima,Y.Ueda,S.Kawakami,S.Ishii and Y.Kawai: "Parameters measurement of ECR C_4F_8/Ar plasma"Thin Solid Films. 345. 130-133 (1999)
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[文献書誌] Y.Ueda,H.Muta and Y.Kawai: "Effect of Electromagnetic Waves Propagating in the Periphery of Electron Cyclotron Resonance Plasma on the Uniformity"Jpn.J.Appl.Phys.. 38,7B. 4333-4337 (1999)
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[文献書誌] Y.Kawai,Y.Ueda,M.Moromito,S.Hiejima and I.Katsumata: "Measurements of ECR silane plasma parameters"Materials Processing Technology. 92-93. 230-234 (1999)
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[文献書誌] M.Shindo,S.Hiejima,Y.Ueda,S.Kawakami,N.Ishii and Y.Kawai: "Determination of negative-ion densityin an electron cyclotron resonance C_4F_8 plasma"Surface and Coating Technology. 116-119. 1065-1069 (1999)