-
[文献書誌] S.Tada, S.Takashima, M.Ito, M.Hamagaki, M.Hori, T.Goto: "Investigation of Nitrogen Atoms in Low-Pressure Nitrogen Plasmas Using a Compact Electron-Beam-Excited Plasma Source"Japanese journal of applied physics. 41・7. 4691-4695 (2002)
-
[文献書誌] S.Tada, M.Ito, M.Hamagaki, M.Hori, T.Goto: "Cleaning of Glass Disk in Oxygen Plasma by Using Compact Electron-Beam-Excited Plasma Source"Japanese journal of applied physics. 41・11. 6553-6556 (2002)
-
[文献書誌] M.Ito, K.Takeda, T.Shiina, Y.Okamura, H.Nagai, M.Hori, T.Goto: "Silicon oxide etching process employing an electron beam excited plasma"Journal of vacuum science and technology. B22・2. 543-547 (2004)
-
[文献書誌] 伊藤昌文: "スーパーレンズ法の原理,応用,展望"精密工学会誌. 69・2. 170-173 (2003)
-
[文献書誌] M.Ito et al.: "Silicon oxide etching process using electron beam excited CF_4/Ar plasmas"Conference proceedings of Joint conference 16^<th> European conference on atomic & molecular physics on ionized gases/5^<th> International conference on reactive plasmas. 1. 195-196 (2002)
-
[文献書誌] M.Ito et al.: "Diagnostics of electron beam excited CF_4/Ar plasmas for silicon oxide etching"Proceedings of 16^<th> International Symposium on Plasma Chemistry. 364. 367 (2003)
-
[文献書誌] K.Takeda et al.: "Silicon Oxide Etcning Process Employing Pulse-modulated Electron Beam Exited Plasma"Proceedings of 25th International Symposium on Dry Process. 133-138 (2003)
-
[文献書誌] M.Ito et al.: "Silicon dioxide etching processes employing electron beam excited plasma"Abstract of American Vacuum Society 50^<th> International Symposium. PS-TuP1 (2003)
-
[文献書誌] M.Ito et al.: "Micromachining process employing pulse-time-modulated electron-beam-excited plasma"The 21^<st> Symposium on plasma processing proceedings. 296-297 (2004)
-
[文献書誌] M.Ito et al.: "Development and diagnostics of micro-machining process using fluorocarbon plasmas"5^<th> International workshop on fluorocarbon plasmas programme and abstracts. 29 (2004)
-
[文献書誌] K.Takeda et al.: "Diagnostics of pulse-modulated electron-beam-excited plasma for silicon-oxide etching"International COE forum on plasma science and technology proceedings. 1. 207-208 (2004)