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[文献書誌] T.Shinada: "Reduction of fluctuation in semiconductor conductivity by one-by-one ion implantation of dopant atoms"Jpn.J.Appl.Phys.. 39. L265-L268 (2000)
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[文献書誌] M.Koh: "New process for Si nanopyramid array(NPA) fabrication by means of ion beam irradiation and wet etching"Jpn.J.Appl.Phys.. 39. 2186-2188 (2000)
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[文献書誌] M.Koh: "High-density nanoetchpit-array fabrication on Si surface using ultrathin SiO2 mask"Jpn.J.Appl.Phys.. 39. 5352-5355 (2000)
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[文献書誌] S.Sawara: "Simple fabrication of high density concave nanopyramid array(NPA) on Si surface"Appl.Surf.Sci.. 159/160. 481-485 (2000)
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[文献書誌] T.Shinada: "Flat-band voltage control of a back-gate MOSFET by single ion implantation"Appl.Surf.Sci.. 162-163. 499-503 (2000)
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[文献書誌] M.Koh: "Simple nanostructuring of Si surfaces by means of focused beam patterning and wet etching"Appl.Surf.Sci.. 162-163. 599-603 (2000)
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[文献書誌] T.Tanii: "Nucleation and growth of Cu clusters on highly oriented pyrolytic graphite observed with an in situ electrochemical scanning tunneling microscope"Appl.Surf.Sci.. 162/163. 662-665 (2000)