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[文献書誌] Takakazu Takahashi: "Atomic Force Microscopy Observation of TiO_2 Films Deposited by dc Reactive Sputtering"Journal of Vacuum Science and Technology A. Vol.20 No.4. 1205-1209 (2002)
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[文献書誌] Takakazu Takahashi: "Effects of Plasma Exposure on Structural and Optical Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Journal of Vacuum Science and Technology A. Vol.20 No.6. 1916-1920 (2002)
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[文献書誌] Takakazu Takahashi: "Dependence of Working Gas Pressure and Ratio of Ar to O_2 On Properties of TiO_2 Films Deposited by Facing Targets Sputtering"Thin Solid Films. Vol.420-421. 433-437 (2002)
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[文献書誌] Takakazu Takahashi: "Influence of Working gas presure on Structure and Optical Properties of WO_3 Films Reactively Deposited by RF Magnetron Sputtering"Journal of Vacuum Science and Technology A. (to be published). (2003)
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[文献書誌] Takakazu Takahashi: "Photocatalytic Properties of TiO_2/WO_3 Bilayers Deposited by Reactive Sputtering"Journal of Vacuum Science and Technology A. (to be published). (2003)
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[文献書誌] Takakazu Takahashi: "Raman Spectroscopy Measurement of TiO_2 Sputtered Films Changing Degree of Plasma Exposure"Journal of Vacuum Science and Technology A. (to be published). (2003)