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[文献書誌] J.Watanabe, T.Hisamatsu, M.Hirano: "Effect of Pre-Thin-Surface Grinding on Copper Chemical Mechanical Polishing"Proceedings of the Sixth International Symposium on Advances in Abrasive Technology. 407-412 (2003)
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[文献書誌] M.Touge, J.Watanabe, Y.Ohbuchi, H.Sakamoto, N.Ueda: "Development of Ultra Thin Quartz by Abrasive Machining"Proceedings of the Sixth International Symposium on Advances in Abrasive Technology. 123-128 (2003)
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[文献書誌] Y.Ishikawa, Y.Matsumoto, Y.Nishida, S.Taniguchi, J.Watanabe: "Surface Treatment of Silicon Carbide Using TiO2(IV) Photocatalyst"J.Am.Chem.Soc.. 125巻、21号. 6558-6562 (2003)
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[文献書誌] N.Kuroda, Y.Iida, T.Shigeta, Hasanudin, J.Watanabe: "Infrared Attenuated Total Reflection by Chemomechanically Polished (0001) Surface of 6H-SiC"Jpn.J.Appl.Phys.. 42巻 10B. L1241-L1243 (2003)
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[文献書誌] 藤田 隆, 渡邉 純二, 佐口明彦: "超LSIプロセスにおける平坦化CMP技術と装置の開発(第2報)-パッドドレッシング均一化技術の開発-"精密工学会誌. 69巻11号. 1610-1614 (2003)