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[文献書誌] Yoji Saito: "Characteristics of plasmaless dry etching of silicon-related materials using chlorine trifluoride gas"Sensors and Materials. 14,5. 231-237 (2002)
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[文献書誌] Y.Saito, H.Takaoka, T.Nishizawa, M.Hamaguchi: "A Study on the reaction between chlorine trifluoride gas and carbon-related materials for semiconductor equipments"Proc.Int.Conf.on Electrical Engineering 2002. 3. 1356-1359 (2002)
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[文献書誌] Yoji Saito: "He-enhanced etching of silicon in fluorocarbon remote plasma system"Proc. of 3^<rd> Korea-Japan Joint Workshop on Advanced Semiconductor Processes and Equipments. 60-63 (2002)
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[文献書誌] 室谷, 小澤, 門馬, 齋藤: "ノンドープポリシリコンを用いた高感度赤外線センサ"第50回応用物理学関係連合講演会予稿集. III. 29a-ZM-2 (2003)
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[文献書誌] 鈴木誠一他4名: "非対称電界を用いたEHDマイクロポンプの開発"電気学会C部門大会予稿集. TC7-1-TC7-2 (2002)
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[文献書誌] S.Suzuki他3名: "Development of An Optical Sensor for Multi-component Immuno-detection"IEEE Sensors 2002. 26.5 (2002)