| 研究課題/領域番号 |
16H02093
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| 研究機関 | 東北大学 |
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研究代表者 |
桑野 博喜 東北大学, 未来科学技術共同研究センター, 教授 (50361118)
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| 研究分担者 |
大口 裕之 東北大学, 材料科学高等研究所, 准教授 (40570908)
LE VANMINH 東北大学, 工学研究科, 助教 (60765098)
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| 研究期間 (年度) |
2016-04-01 – 2021-03-31
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| キーワード | Focused ion beams / multi-ion sources / ion source / ionic liquid |
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| 研究実績の概要 |
We developed the multi-focused ion beams (multi-FIB) with 5x5 Si-emitter arrays by Si micromachining. Two types of the multi-FIBs with the front-side and the back-side (ionic liquid) IL supplies obtained the emitter tip of sub-50 nm, the diameter of 180 μm and the height of 240 μm for convenient IL supplies. Three types of IL sources including EMIM-Im, EMIM-BF4, and BMIM-PF6 were investigated in this study. The high etching rates of the irradiated Si target were obtained by F-based ion sources. The EMIM-Im showed the highest maximum etching rate of approximately 1600 μm3/min. The interaction of the ion beams and Si targets by in-situ mass spectra and the chemical shifts of Si2p binding energy by the X-ray photoelectron spectra confirmed the reactive mechanism of the ion beam sources.
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| 現在までの達成度 (区分) |
現在までの達成度 (区分)
2: おおむね順調に進展している
理由
イオン液体を用いたマルチ集束イオンビームの特性について加工に影響するイオン種、エネルギー、イオンビーム照射面の表面分析などにより明らかにした。これはほぼ計画通りの成果である。
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| 今後の研究の推進方策 |
Ion beam emission analysis：
The multi-FIB is supplied with three IL sources such as EMIM-Im, EMIM-BF4, and BMIM-PF6 ion liquid for characterizing the ion beam emission. The I-V curves will be investigated in the range of applied voltage from 0 V to 5 kV.
The ion emission currents of three types IL sources will be measured. Three IL sources will be clarified by exhibiting clearly the starting emission voltage. Since the emission current is increased distinctively from BMIM-BF6, EMIM-Im, to EMIM-BF4 at the same applied voltage, some influence of ion beam acceleration voltage should be clarified a analysis of beam species. The aim of the research is to clarify a mechanism of this IL ion emission and to increase the ion beam current.
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