フェムト秒パルスラジオリシス法によるナノ時空間反応プロセスの解明

研究成果発表報告書

• 研究課題/領域番号: 17106014
• 研究種目: 基盤研究(S)
• 配分区分: 補助金
• 研究分野: 原子力学
• 研究機関: 大阪大学
• 研究代表者: 田川 精一 大阪大学, 産業科学研究所, 教授 (80011203)
• 研究分担者: 古澤 孝弘 大阪大学, 産業科学研究所, 准教授 (20251374) ; 関 修平 大阪大学, 工学研究科, 准教授 (30273709) ; 佐伯 昭紀 大阪大学, 産業科学研究所, 助教 (10362625) ; 岡本 一将 大阪大学, 産業科学研究所, 特任助教 (10437353) ; 山本 洋揮 大阪大学, 産業科学研究所, 特任助教 (00516958)
• 研究期間 (年度): 2005 – 2008

研究成果

• [雑誌論文] Dependence of Acid Generation Efficiency on Molecular Structures of Acid Generators upon Exposure to Extreme Ultraviolet Radiation (2008)
  • 著者名/発表者名: R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
  • 雑誌名: Appl. Phys. Express 巻: 1 ページ: 027004
  • 査読あり
• [雑誌論文] Difference in Reaction Schemes in Photolysis of Triphenylsulfonium Salts between 248 nm and Dry/Wet 193 nm Resists (2008)
  • 著者名/発表者名: Y. Matsui, H. Sugawara, S. Seki, T. Kozawa, S. Tagawa, T. Itani
  • 雑誌名: Appl. Phys. Express 巻: 1 ページ: 036001
  • 査読あり
• [雑誌論文] Resolution degradation caused by multispur effect in chemically amplified extreme ultraviolet resists (2008)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, M. Shell
  • 雑誌名: J. Appl. Phys. 巻: 103 ページ: 084306
  • 査読あり
• [雑誌論文] Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication (2008)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 47 ページ: 4465-4468
  • 査読あり
• [雑誌論文] Effects of Rate Constant for Deprotection on Latent Image Formation in Chemically Amplified Extreme Ultraviolet Resists (2008)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 47 ページ: 4926-4931
  • 査読あり
• [雑誌論文] Study of the Reaction of Acid Generators with Epithermal and Thermalized Electrons (2008)
  • 著者名/発表者名: K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 47 ページ: 4932-4935
  • 査読あり
• [雑誌論文] Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction (2008)
  • 著者名/発表者名: T. Kozawa, S. Tagawa J. J. Santillan, T. Itani
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 26 ページ: 2257-2260
  • 査読あり
• [雑誌論文] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified Resist for Extreme Ultraviolet Lithography (2007)
  • 著者名/発表者名: R. Hirose, T. Kozawa, S. Tagawa, T. Kai, T. Shimokawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 46 ページ: L979-L981
  • 査読あり
• [雑誌論文] Study of Acid-Base Equilibrium in Chemically Amplified Resist (2007)
  • 著者名/発表者名: K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 46 ページ: 7285-7289
  • 査読あり
• [雑誌論文] Theoretical Study on Relationship between Acid Generation Efficiency and Acid Generator Concentration in Chemically Amplified Extreme Ultraviolet Resists (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, M. Shell
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 46 ページ: L1143-L1145
  • 査読あり
• [雑誌論文] Point Spread Function for the Calculation of Acid Distribution in Chemically Amplified Resists Used for Electron-Beam Lithography (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 46 ページ: L1200-L1202
  • 査読あり
• [雑誌論文] Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 25 ページ: 2295-2300
  • 査読あり
• [雑誌論文] Acid distribution in chemically amplified extreme ultraviolet resist (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 25 ページ: 2481-2485
  • 査読あり
• [雑誌論文] Polymer structure dependence of acid generation in chemically amplified extreme ultraviolet resists (2007)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 46 ページ: L142-L144
  • 査読あり
• [雑誌論文] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist (2006)
  • 著者名/発表者名: T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 24 ページ: 3055-3060
  • 査読あり
• [雑誌論文] Acid generation efficiency in a model system of chemically amplified extreme ultraviolet resist (2006)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, H. Oizumi, I. Nishiyama
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 24 ページ: L27-L30
  • 査読あり
• [雑誌論文] Correlation between proton dynamics and line edge roughness in chemically amplified resist for post-optical lithography (2006)
  • 著者名/発表者名: A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 24 ページ: 3066-3072
  • 査読あり
• [雑誌論文] Acid Generation Mechanism of Poly (4-hydroxystyrene) -Based Chemically Amplified Resists for Post-Optical Lithography : Acid Yield and Deprotonation Behavior of Poly (4-hydroxystyrene) and Poly (4-methoxystyrene) (2006)
  • 著者名/発表者名: A. Nakano, T. Kozawa, K. Okamoto, S. Tagawa, T. Kai, T. Shimokawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 45 ページ: 6866-6871
  • 査読あり
• [雑誌論文] Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist (2006)
  • 著者名/発表者名: T. Shigaki, K. Okamoto, T. Kozawa, H. Yamamoto, S. Tagawa, T. Kai, T. Shimokawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 45 ページ: 5735-5737
  • 査読あり
• [雑誌論文] Reaction mechanism of fluorinated chemically amplified resists (2006)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, K. Okamoto, A. Saeki, S. Tagawa, T. Ando, M. Sato, H. Komano
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 24 ページ: 1833-1836
  • 査読あり
• [雑誌論文] Pulse radiolysis based on a femtosecond electron beam and a femtosecond laser light with double-pulse injection technique (2006)
  • 著者名/発表者名: J. Yang, T. Kondoh, T. Kozawa, Y. Yoshida, S. Tagawa
  • 雑誌名: Radiat. Phys. Chem. 巻: 75 ページ: 1034-1040
  • 査読あり
• [雑誌論文] Line edge roughness of a latent image in post-optical lithography (2006)
  • 著者名/発表者名: A. Saeki, T. Kozawa, S. Tagawa, H. B. Cao
  • 雑誌名: Nanotechnology 巻: 17 ページ: 1543-1546
  • 査読あり
• [雑誌論文] Reactivity of Acid Generators for Chemically Amplified Resists with Low-Energy Electrons (2006)
  • 著者名/発表者名: A. Nakano, T. Kozawa, S. Tagawa, T. Szreder, J. F. Wishart, T. Kai, T. Shimokawa
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 45 ページ: L197-L200
  • 査読あり
• [雑誌論文] Femtosecond single electron bunch generation by rotating longitudinal bunch phase space in magnetic field (2006)
  • 著者名/発表者名: J. Yang, T. Kondoh, K. Kan, T. Kozawa, Y. Yoshida, S. Tagawa
  • 雑誌名: Nucl. Instrum. Meth. A 巻: 556 ページ: 52-56
  • 査読あり
• [雑誌論文] Reaction Mechanisms of Brominated Chemically Amplified Resists (2005)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, A. Nakano, S. Tagawa, T. Ando, M. Sato, H. Komano
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 44 ページ: L842-L844
  • 査読あり
• [雑誌論文] Requirements for Laser-Induced Desorption/Ionization on Submicrometer Structures (2005)
  • 著者名/発表者名: S. Okuno, R. Arakawa, K. Okamoto, Y. Matsui, S. Seki, T. Kozawa, S. Tagawa, Y. Wada
  • 雑誌名: Anal. Chem. 巻: 77 ページ: 5364-5369
  • 査読あり
• [雑誌論文] Study on acid generation from polymer (2005)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
  • 雑誌名: J. Vac. Sci. Technol. B 巻: 23 ページ: 2728-2732
  • 査読あり
• [雑誌論文] Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography (2005)
  • 著者名/発表者名: A. Nakano, K. Okamoto, Y. Yamamoto, T. Kozawa, S. Tagawa, T. Kai, H. Nemoto
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 44 ページ: 5832-5835
  • 査読あり
• [雑誌論文] Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography (2005)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, A. Nakano, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
  • 雑誌名: Jpn. J. Appl. Phys. 巻: 44 ページ: 5836-5838
  • 査読あり
• [学会発表] Nanoscale Distribution of Intermediates in Resist Materials for Next Generation Lithography (2007)
  • 著者名/発表者名: T. Kozawa, and S. Tagawa
  • 学会等名: ASR Symposium
  • 発表場所: Ibaraki, Japan
  • 年月日: 2007-11-06 – 2007-11-09
• [学会発表] Dependence of Absorption Coefficient and Acid Generation Efficiency on Acid Generator Concentration in Chemically Amplified EUV Resist (2007)
  • 著者名/発表者名: R. Hirose, T. Kozawa, S. Tagawa, T. Kai and T. Shimokawa
  • 学会等名: Microprocess and Nanotechnology Conference
  • 発表場所: Kyoto, Japan
  • 年月日: 2007-11-05 – 2007-11-08
• [学会発表] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist (2007)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, S. Tagawa, H. Yukawa, M. Sato, J. Onodera
  • 学会等名: Microprocess and Nanotechnology Conference
  • 発表場所: Kyoto, Japan
  • 年月日: 2007-11-05 – 2007-11-08
• [学会発表] Study on the Reaction of Acid Generators with Epithermal Electrons (2007)
  • 著者名/発表者名: K. Natsuda, T. Kozawa, A. Saeki, S. Tagawa, T. Kai, T. Shimokawa
  • 学会等名: Microprocess and Nanotechnology Conference
  • 発表場所: Kyoto, Japan
  • 年月日: 2007-11-05 – 2007-11-08
• [学会発表] Effects of rate constant for deprotection reaction on latent image formation in chemically amplified EUV resists (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, and T. Itani
  • 学会等名: Microprocess and Nanotechnology Conference
  • 発表場所: Kyoto, Japan
  • 年月日: 2007-11-05 – 2007-11-08
• [学会発表] Depth profile of acid generator distribution in chemically amplified resists (2007)
  • 著者名/発表者名: T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganesawa, K. Horie
  • 学会等名: Microprocess and Nanotechnology Conference
  • 発表場所: Kyoto, Japan
  • 年月日: 2007-11-05 – 2007-11-08
• [学会発表] Effect of Fluorine Atom on Acid Generation in Chemically Amplified EUV Resist (2007)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, S. Tagawa H. Yukawa, M. Sato, H. Komano
  • 学会等名: 2007 International EUVL Symposium
  • 発表場所: Sapporo, Japan
  • 年月日: 2007-10-28 – 2007-10-31
• [学会発表] Effects of activation energy for deprotection reaction on latent image contrast (2007)
  • 著者名/発表者名: T. Kozawa, A. Saeki, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • 学会等名: 2007 International EUVL Symposium
  • 発表場所: Sapporo, Japan
  • 年月日: 2007-10-28 – 2007-10-31
• [学会発表] Pulse radiolysis of polystyrene and derivatives (2007)
  • 著者名/発表者名: K. Okamoto, M. Tanaka, T. Kozawa, S. Seki, S. Tagawa
  • 学会等名: 13th International Congress of Radiation Research
  • 発表場所: San Francisco, California, USA
  • 年月日: 2007-07-07 – 2007-07-13
• [学会発表] High precision measurement of higher diffraction-order contamination in monochromatized soft X-ray by using a compact transmission-grating spectrometer (2007)
  • 著者名/発表者名: K. Fukui, T. Sakai, T. Hatsui, N. Kosugi, Y. Hamamura, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa
  • 学会等名: International Conference on Vacuum Ultraviolet Radiation Physics 15th
  • 発表場所: Berlin, Germany
  • 年月日: 2007-06-29 – 2007-07-03
• [学会発表] Development and performance of quasi-free standing transmission-grating for soft X-ray emission spectrometer (2007)
  • 著者名/発表者名: T. Hatsui, K. Okamoto, Y. Matsui, T. Kozawa, S. Seki, S. Tagawa, Y. Hamamura, N. Kosugi
  • 学会等名: International Conference on Vacuum Ultraviolet Radiation Physics 15th
  • 発表場所: Berlin, Germany
  • 年月日: 2007-06-29 – 2007-07-03
• [学会発表] Study on dynamics of radical ions of polystyrenes by pulse radiolysis (2007)
  • 著者名/発表者名: K. Okamoto, M. Tanaka, S. Seki, T. Kozawa, S. Tagawa
  • 学会等名: 13th International Congress of Radiation Research
  • 発表場所: San Francisco, California, USA
  • 年月日: 2007-06-07 – 2007-06-13
• [学会発表] Acid distribution in chemically amplified extreme ultraviolet resist (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, H. B. Cao, H. Deng, M. J. Leeson
  • 学会等名: The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
  • 発表場所: Denver, Colorado, USA
  • 年月日: 2007-05-29 – 2007-06-01
• [学会発表] Image Contrast Slope and Line Edge Roughness of Chemically Amplified Resists for Post-Optical Lithography (2007)
  • 著者名/発表者名: T. Kozawa, S. Tagawa, J. J. Santillan, M. Toriumi, T. Itani
  • 学会等名: The fifty-first international conference on electron, ion, and photon beam technology and nanofabrication (51st EIPBN)
  • 発表場所: Denver, Colorado, USA
  • 年月日: 2007-05-29 – 2007-06-01
• [学会発表] Single-Component Chemically Amplified Resist Based on Dehalogenation of Polymer (2007)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, S. Tagawa, K. Ohmori, M. Sato, H. Komano
  • 学会等名: SPIE Advanced Microlithography
  • 発表場所: San Jose, California, USA
  • 年月日: 2007-02-25 – 2007-03-02
• [学会発表] Study on photochemical analysis system for EUV lithography (2007)
  • 著者名/発表者名: A. Sekiguchi, Y. Kono, M. Kadoi, Y. Minami, T. Kozawa, S. Tagawa, D. Gustafson, P. Plackborow
  • 学会等名: SPIE Advanced Microlithography
  • 発表場所: San Jose, California, USA
  • 年月日: 2007-02-25 – 2007-03-02
• [学会発表] Effect of Acid Diffusion and Polymer Structure on Line Edge Roughness (2006)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, A. Saeki, K. Okamoto, S. Tagawa, K. Ohmori, M. Sato, H. Komano
  • 学会等名: Int. Microprocesses and Nanotechnology Conf.
  • 発表場所: Kamakura, Japan
  • 年月日: 2006-10-25 – 2006-10-27
• [学会発表] Proton Dynamics and Amines in Chemically Amplified Resist (2006)
  • 著者名/発表者名: K. Natsuda, T. Kozawa, K. Okamoto, S. Tagawa
  • 学会等名: Int. Microprocesses and Nanotechnology Conf.
  • 発表場所: Kamakura, Japan
  • 年月日: 2006-10-25 – 2006-10-27
• [学会発表] Line edge roughness in chemically amplified resist of electron beam lithography (2006)
  • 著者名/発表者名: A. Saeki, T. Kozawa, S. Tagawa and H. B. Cao
  • 学会等名: 50th EIPBN
  • 発表場所: Baltimore, Maryland, USA
  • 年月日: 2006-05-30 – 2006-06-02
• [学会発表] Analysis of Acid Yield Generated in Chemically Amplified Electron Beam Resist (2006)
  • 著者名/発表者名: T. Kozawa, T. Shigaki, K. Okamoto, A. Saeki and S. Tagawa
  • 学会等名: 50th EIPBN
  • 発表場所: Baltimore, Maryland, USA
  • 年月日: 2006-05-30 – 2006-06-02
• [学会発表] Difference between initial distributions of proton and counter anion in chemically amplified electron-beam resist (2006)
  • 著者名/発表者名: T. Kozawa, H. Yamamoto, A. Saeki and S. Tagawa
  • 学会等名: 31st Int. Symp. Microlithography
  • 発表場所: San Jose, California, USA
  • 年月日: 2006-02-19 – 2006-02-24
• [学会発表] The reaction mechanism of poly[4-hydroxystyrene-co-4-(1, 1, 1, 3, 3, 3-hexafluoro-2- hydroxypropyl)-styrene] (2006)
  • 著者名/発表者名: H. Yamamoto, T. Kozawa, K. Okamoto, S. Tagawa, T. Ando, M. Sato, H. Komano
  • 学会等名: 31st Int. Symp. Microlithography
  • 発表場所: San Jose, California, USA
  • 年月日: 2006-02-19 – 2006-02-24