研究実績の概要 |
This research focuses on metal-assisted chemical etching method for micro/nano device fabrication. Research achievements can be summarized, as following: 1. High aspect ratio silicon structures produced via metal assisted chemical etching and assembly technology for cantilever fabrication. 2. Cantilever with high aspect ratio nano pillars on its surface for moisture detection in electronic products. 3. Ion transportation by gating voltage to nanopores produced via metal assisted chemical etching method. 4. Low cost and high-aspect ratio micro/nano device fabrication by using innovative metal-assisted chemical etching method.
|