研究課題/領域番号 |
18F18725
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研究機関 | 東京大学 |
研究代表者 |
野村 政宏 東京大学, 生産技術研究所, 准教授 (10466857)
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研究分担者 |
GLUCHKO SERGEI 東京大学, 生産技術研究所, 外国人特別研究員
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研究期間 (年度) |
2018-07-25 – 2020-03-31
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キーワード | phonon polariton / phonon engineering |
研究実績の概要 |
a. I've been working on the improvement of the sensitivity of our micro time-domain thermoreflectance (TDTR) set-up in order to sense one order of magnitude smaller temperature variations of the sample as well as changing the data analysis. I have also fabricated samples and studied the thermal conductivity of the phononic crystal with strongly asymmetric holes as well as phonon ballisticity in nanowires. These two projects provided the knowledge to design an experiment that has enough sensitivity to measure the Surface Phonon Polaritonic (SPhP) thermal conductivity of fully suspended thin dielectric membranes. For that, we required installing a new vacuum chamber that can support temperatures up to 800K as well as developing a new samples fabrication method based on fully suspended membrane technology. The article where we finalize these results is currently under preparation. b. I have also supervised a master student where we have developed a new fabrication technique of maskless lowcost nanocones fabrication and thermal measurements.
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現在までの達成度 (区分) |
現在までの達成度 (区分)
2: おおむね順調に進展している
理由
No big problem so far and the project is going along the plan.
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今後の研究の推進方策 |
We plan to fabricate an SPhP cavity using the same fabrication technique that we have developed for our previous study and measure the SPhPs passive concentration by an improved version of TDTR technique. This requires the following steps: a. Finalizing the sample design. b. Electron beam lithography and electron beam physical vapor deposition combination followed by focused ion beam etching of fully suspended SiN membranes. c. TDTR measurements of the samples with two different cryostats that would provide the data in the temperature range from 4K to 750K d. Data analysis and finalizing the results.
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