| 研究課題/領域番号 |
20K05161
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| 研究種目 |
基盤研究(C)
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| 配分区分 | 基金 |
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| 応募区分 | 一般 |
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| 審査区分 |
小区分26050:材料加工および組織制御関連
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| 研究機関 | 国立研究開発法人産業技術総合研究所 |
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研究代表者 |
山田 ムハマドシャヒン 国立研究開発法人産業技術総合研究所, エレクトロニクス・製造領域, 研究員 (90868746)
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| 研究期間 (年度) |
2020-04-01 – 2023-03-31
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| キーワード | Plasma assistance AD / Single particle / Bonding mechanism / Deposition mechanism |
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| 研究成果の概要 |
In this project, I developed the single particle (coating built-up unit) concept to investigate the PAD mechanism. The behavior of the single particle deposition was investigated by using a multi-layer high-speed shutter (to avoid the huge number of particle depositions).
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| 自由記述の分野 |
Material processing and microstructure control
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| 研究成果の学術的意義や社会的意義 |
The single particle concept was promising to clarify the coating formation and bonding mechanisms of the new coating region of PAD. It was helpful to promote technology development and enable the formation of thick and dense coatings on different shapes of objects from flat to 3D.
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