研究実績の概要 |
The project aims to develop photochemical solution processing of high performance thin film encapsulation (TFE) using vacuum ultraviolet (VUV) light for the purpose of protection of organic electronics from exposure to water and oxygen. Selection of precursor solutions, tuning of VUV conditions, atmosphere, as well as designing architectures of multilayers are considered as important parameters to achieve high barrier layers. So far, we have developed high barrier TFE in a structure of polydimethylsiloxane (PDMS)/SiOx/SiNy/SiOxNy, by a combination of two Si-based polymer coatings, UV-curable PDMS, perhydropolysilazane (PHPS), and their photochemical conversion. The presence of soft, elastic PDMS and its surface conversion to SiOx to improve wetting resulted in strong adhesion at the interfaces and relaxed strain to avoid cracks in ultrathin and high density SiOxNy to serve as an effective encapsulationn. In-deep study of the formation mechanism of SiOxNy layers derived from PHPS has been conducted using various spectroscopic investigations for the understanding of the photochemical processes and activation reactions. In addition, we have also extensively studied the metal oxide thin films by photochemical conversion of metal-organic precursors. The photoluminescent (PL) properties of such obtained thin films were examined, and color-tunable PL from violet (389 nm) to bluish-green (486 nm) by adjusting the period of VUV irradiation has been realized. The work has been published in J. Phys. Chem. C, 2021, 125, 9, 5417-5424.
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今後の研究の推進方策 |
The apparatus equipped with an excimer lamp and different gas resources has been setup. Effect of precursors, coating conditions, temperature, especially interesting on the effect of atmosphere such as water, oxygen and ammonia on the formation of thin films are to be investigated in this year.
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