研究課題
We focused on the Al2O3/diamond interface by modulating the pre-wet treatment times before the ALD process. We found that the sample without wet annealing treatment shows large Dit, in the order of 1012~1013 cm－2eV－1. Dit is reduced by one order of magnitude lower when wet annealing treatments were performed. Dit has no significant change with increasing wet annealing treatments. The sample with annealing for 3h shows lower Dit in the relatively deep energy position.
すべて 2022
すべて 学会発表 (3件) (うち国際学会 2件、 招待講演 1件)
