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[文献書誌] 高橋昌男: "Ti_<1-X>Al_XN固溶体におけるバンドギャップの構造化学的研究" 粉体および粉末冶金. 34. 136-140 (1987)
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[文献書誌] 稲村偉: "RFースパッタ法によって合成されたTi_<1ーX>Al_XN薄膜の耐酸化性" 材料. 37. 83-86 (1988)
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[文献書誌] Masao Takahashi: "Nitride thin films" Mem.Inst.Sci.Ind.Res.,Osaka Univ.46. 25-35 (1989)
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[文献書誌] Shinichi Kikkawa: "New Materials for Advanced Lithium Battery-especially on Plasma-Assisted CVD of TiS_2" Mem.Inst.Sci.Ind.Res.,Osaka Univ.46. 63-70 (1989)
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[文献書誌] Masao Takahashi: "Durability against Oxidation for Ti_<1-X>Al_XN Thin Films" Composites and Corrosion/Coating of Advanced Materials,ed.by S.Umekawa et al.,Materials Research Society,Pennsylvania. (1989)
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[文献書誌] 森山斉昭: "RF-スパッタ法によって作製したY-Ba-Cu-O系薄膜の結晶化" 粉体および粉末冶金. 36. 123-127 (1989)
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[文献書誌] Gao-Chao Lai: "Phase transition in B1-type Mo_<1-X>Nb_XN sputtered films under ammonia annealing" J.Solid State Chem.82. 1-7 (1989)
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[文献書誌] Gao-Chao Lai: "Electronic properties of B1 type solid solution in the systems of MoN-MN(M=Nb,Zr)" Proc.Int.Conf.Electronic Components and Materials,Beijing. November. 405-408 (1989)
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[文献書誌] Gao-Chao Lai: "Preparation and characterization of superconductig B1 type Mo_<1-X>Nb_XN thin films" J.Amer.Cer.Soc.72. 2310-2313 (1990)
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[文献書誌] Shinichi Kikkawa: "Deposition Process and Some Characteristics of TiS_2 Prepared by Plasma CVD" Mem.Inst.Sci.Ind.Res.,Osaka Univ.