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[文献書誌] J.Harada,N.Kashiwagura: "Surface Morphology of Mechanically and Chemically Polished Semiconductor Wafers" Colloque de Physique,Colloque C7. 50. C7・129-C7・144 (1989)
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[文献書誌] A.Iida,Y.Gohshi,K.Sakurai,S.Komiya: "Analysis of Contamination Layer of InP during LPE Process by Synchrotron Radiation-Excited X-Ray Fluorescence." Jpn.J.Appl.Phys.27. L1825-L1828 (1988)
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[文献書誌] T.Takahashi,T.Ishikawa,S.Nakatani,S.Kikuta,N.Okamoto: "Studies on Si(111)√<3>-Bi andーAg Surfaces by X-Ray Diffraction under Nearly Normal Incidence" Rev.Sci.Instrum.60. 2365-2368 (1989)