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1995 Fiscal Year Final Research Report Summary

EXPERIMENTAL STUDY ON SPUTTER ION PUMP FOR WIDE PRESSURE RANGE

Research Project

Project/Area Number 05555011
Research Category

Grant-in-Aid for Developmental Scientific Research (B)

Allocation TypeSingle-year Grants
Research Field 表面界面物性
Research InstitutionSUZUKA NATIONAL COLLEGE OF TECHNOLOGY

Principal Investigator

FUNATO Yasuyuki  SUZUKA NATIONAL COLLEGE OF TECHNOLOGY,DEPARTMENT OF ELECTRIC AND INFORMATION ENGINEERING,PROFESSOR,DR., 電子情報工学科, 教授 (10005358)

Co-Investigator(Kenkyū-buntansha) TAKAGI Nozomi  ULVAC CO., HEAD OF UHV., 超高真空部, 室長
MUSHIAKI Motoi  KAWASAKI MEDICAL SCHOOL,RESEARCH ASSIST., 物理教室, 助手 (50122453)
KUBOTA Yusuke  NATIONAL INSTITUTE FOR NUCLEAR FUSION,RESEARCH ASSIST., 大型ヘリカル研究部, 助手 (50023726)
AKAISHI Kenya  NATIONAL INSTITUTE FOR NUCLEAR FUSION,ASSOC.PROF., DR., 大型ヘリカル研究部, 助教授 (90023720)
NAGASHIMA Takayoshi  SUZUKA NATIONAL COLLEGE OF TECHNOLOGY,DEPARTMENT OF ELECTRIC AND INFORMATION ENG, 電子情報工学科, 助教授 (30237515)
Project Period (FY) 1993 – 1995
KeywordsLaB6 Cathode / Wide pressure range / Water pumping / Sputter pump / QMS measurement / XPS measurement / Plasma parameter / Ultra high vacuum
Research Abstract

The experimental investigation of a sputter ion pump were performed for wide pressure range. The vacuum chamber has a diameter of 6 inches and an length of 200mm. The Lanthanum hexaboride (LaB6) disk of 50mm diameter are used for sputter cathode. The experimental device consists of discharge section and analysis one. The measurements involves ionization gauge, partial pressure gauge, electro static probe for plasma parameters and XPS measurement. The experiment was done by using a glow discharge plasma' and to create boron like thin films on the chamber wall surface. The preliminary experiment showed that the boron film formed on the vacuum wall can pump effectively water vapor. The experiment investigate the correlations between partial pressures of H2O,H2, O2 and plasma parameters of density, temperature and sputter film characteristics during a sputter discharge. The application of LaB6 cathode is a characteristic point of the experiment for developing a new type of sputter vacuum pump. The plasma parameters were measured by Langumuir probe and were estimated to be (2-30) x10^9 of density and 3-5 eV of temperature. The partial pressure was measured by QMS.The most typical result of the experiment is that the water vapor is pumped effectively for wide pressure range by using the LaB6 sputter cathode. The pumping speed is estimated to be about 4m^3/ (m^2s). XPS was performed on the sample tip inserted in the sputter discharge. The signals of B,La, O and C were detected. And the depth profiles of their signals were also measured. The experiment indicated that the sputter discharge with LaB6 cathode can be used for a new type of sputter vacuum pump.

  • Research Products

    (16 results)

All Other

All Publications (16 results)

  • [Publications] Y.Funato: "Distributions of Plasma Parameters in a Sputter Discharge" Proc.XXIII.Int.Conf.on Phenomena Ionized Gases,Toulouse(1997). (to be published). (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Funato: "H20 Pumuping by Sputter Discharge with a LaB6 Cathode" J.Vac.Sci.Technol.,. A14(2). 404-407 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Mushiaki: "Pumping down characteristics of LaB6 and TiN coated vacuum vessels prepared by magnetron sputtering" Vacuum,Vol.47/No.6-8,657-659. 47. 657-659 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] D.Kawamura: "Experiments on the Reduction of Oxygen Pertial Pressure by Glow Discharge Plasma" Memoirs of Suzuka College of Technol.22.9. 195-199 (1996)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Mushiaki: "CHARACTERISTICS OF GLOW DISCHARGE SPUTTERING WITH A LaB6 CATHODE" Proc.of the 12th Symposium on PLASMA PROCESSING;Sendai,. 119-122 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] N.Takagi: "Characteristics of a Cold Cathode Gauge for ATF" Proc.of the 20th Linear Accelerator Meeting in Japan,. Sep. 162-162 (1995)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Funato: "CHARACTERISTICS OF PENNING TYPE DISCHARGE WITH LaB6 CATHODE FOR SPUTTER ION PUMP" Proc.XXI.Int.Conf.on Phenomena in Ionized Gases,Bochum,(1993). 2. 317-318 (1993)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Akaishi: "Scaling Law of Outgassing with a Pumping Parameter" 41^<st> National Symposium American Vacuum Society,Denver,Oct.24-28. 159-159 (1994)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y.Funato: ""Distributions of Plasma Parameters in a Sputter Discharge"" Proc.XXIII.Int.Conf.on Phenomena in Ionized Gases, Toulouse (1997). (to be published). (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Funato: ""H20 Pumuping by Sputter Discharge with a LaB6 Cathode"" J.Vac.Sci.Technol.A14(2), Mar/Apr. 404-407 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Mushiaki: ""Pumping down characteristics of LaB6 and TiN coated vacuum vessels prepared by magnetron sputtering"" Vacuum. Vol.47/No.6-8. 657-659 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] D.Kawamura: ""Experiments on the Reduction of Oxygen Partial Pressure by Glow Discharge Plasma"" Memoirs of Suzuka College of Technology. Vol.29, No.2. 195-199 (1996)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Mushiaki: ""CHARACTERISTICS OF GLOW DISCHARGE SPUTTERING WITH A LaB6 CATHODE"" Proc.of the 12th Symposium on PLASMA PROCESSING ; Sendai, (1995). 119-122 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] N.Takagi: ""Characteristics of a Cold Cathode Gauge for ATF"" Proc.of the 20th Linear Accelerator Meeting in Japan, Sep.1995. 162 (1995)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y.Funato: ""CHARACTERISTICS OF PENNING TYPE DISCHARGE WITH LaB6 CATHODE FOR SPUTTER ION PUMP"" Proc.XXI.Int.Conf.on Phenomena in Ionized Gases, Bochum, (1993). 317-318 (1993)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.Akaishi: ""Scaling Law of Outgassing with a Pumping Parameter" , 41^<st> National Symposium American Vacuum Society, Denver, Oct.24-28" 1994. 159 (1994)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-03-09  

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