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1998 Fiscal Year Final Research Report Summary

Fabrication of super sensitive ultraviolet photodetector

Research Project

Project/Area Number 09450133
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Electronic materials/Electric materials
Research InstitutionMeijo University

Principal Investigator

AKASAKI Isamu  Meijo University Fac.Sci.& Technol.Professor, 理工学部, 教授 (20144115)

Co-Investigator(Kenkyū-buntansha) AMANO Hiroshi  Meijo University Fac.Sci.& Technol.Associate Professor, 理工学部, 助教授 (60202694)
Project Period (FY) 1997 – 1998
KeywordsGroup III nitride / Widegap Semiconductor / Ultraviolet / Photodetector / pn-diode / Photo-cell
Research Abstract

In order to fabricate highly resistive undoped GaN, correlation between growth condition and electrical properties has been intensively studied. It is found that with increase of ammonia flow rate during growth, resistivity of undoped GaN become higher and higher. Highly pure undoped GaN with residual impurity concentration of less than 10^<14>cm^3 has been achieved.
New growth sequence has been established, by which threading dislocation density of GaN on sapphire has been reduced more than two orders of magnitude. This new method was also applied to grow AlGaN.Crack free and high quality AlGaN with a whole compositional range can be grown.
UV photo-cell was fabricated using undoped GaN grown by the new method. It showed photo-response even under the very weak illumination condition with a power of 100pW/cm^2. UV photo-cell based on undoped Al_<0.2>Ga_<0.8>N was also been fabricated. Cut off wavelength is 335 nm, and the sensitivity is 5A/W, which is the world's highest ever reported.
GaN based pn-junction diode was fabricated. Origin of the leakage current has been intensively studied. At low bias condition, surface leakage current through mesa is dominant, while at high bias condition, tunnel current is dominant. The new photodiode showed very low leakage current of 0.8pA.

  • Research Products

    (18 results)

All Other

All Publications (18 results)

  • [Publications] H.Kato, T.Takeuchi, R.Mizuhoto, S.Yamaguchi, C.Wetzel, H.Amano, I.Akasaki, Y.Kaneko and N.Yamada: "CaN Based Laser Diode with Focused Ion Beams Etched Mirrors" Jpn.J.Appl.Phys.37. L444-L446 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Sakai, T.Takeuchi, H.Amano and I.Akasaki: "GaNの誘導放出機構と混晶効果" レーザ研究. 25. 510-513 (1997)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 天野 浩、竹内 哲也、山口 栄雄、Christian Wetzel、赤崎 勇: "サファイア上GaNの成長過程と結晶学的特性およびGaN上Al GaN, Gal nNの結晶学的特性" 電子情報通信学会誌. C-11 J81-C-11. 65-71 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] C.Pemot, A.Hirano, H.Amano and I.Akasaki: "Investigation of the Leakage Current in GaN P-N Junctions" Jpn.J.Appl.Phys.37. L1202-L1204 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S.Yamaguchi, M.Kariya, S.Nitta, T.Takeuchi, C.Wetzel, H.Amano and I.Akasaki: "Observation of photoluminescence from Al_<1-x>In_xnN heteroepitaxial films grown by metalorganic vapor phase epitaxy" Appl.Phys.Lett.73, No.6,. 830-831 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] M.Iwaya, T.Takeuchi, S.Yamaguchi, C.Wetzel, H.Amano and I.Akasaki: "Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaN"^<GaN">" Jpn.J.Appl.Phys.37 Part 2, No.2B,. L316-L318 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Amano, M.Iwaya, T.Kashima, M.Katsuragawa, I.Akasaki, J.Han, S.Hearne, J.A.Floro, E.Chason and J.Figiel: "Stress and Defect Control in GaN Using Low Temperature Interlayers" Jpn.J.Appl.Phys.37. L1540-L1542 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] H.Kato, T.Takeuchi, R.Mizuhoto, S.Yamaguchi, C.Wetzel, H.Amano, I.Akasaki, Y.Kaneko and N.Yamada: "GaN Based Laser Diode with Focused Ion Beams Etched Mirrors" Jpn.J.Appl.Phys.37. L444-L446 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Sakai, T.Takeuchi, H.Amano and I.Akasaki: "Mechanism of stimulated emission from GaN and the effect of alloying" The Review in Laser Engineering. 25. 510-513 (1997)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Amano, T.Takeuchi, S.Yamaguchi, C.Wetzel, and I.Akasaki: "Characterization of crystalline quality of GaN on sapphire and ternary alloys on GaN" Trans.Inst.Electron.Inform.& Communic.Engineers. C-II(J81-C-II). 65-71 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] C.Pernot, A.Hirano, H.Amano and I.Akasaki: "Investigation of the Leakage Current in GaN P-N Junctions" Jpn.J.Appl.Phys.37. L1202-1204 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] S.Yamaguchi, M.Kariya, S.Nitta, T.Takeuchi, C.Wetzel.H.Amano and I.Akasaki: "Observation of photoluminescence from Al_<1-x>In_xN heteroepitaxial films grown by metalorganic vapor phase epitaxy" Appl.Phys.Lett.73. 830-831 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.Iwaya, T.Takeuchi, S.Yamaguchi, C.Wetzel, H.Amamo and I.Akasaki: "Reduction of Etch Pit Density in Organometallic Vapor Phase Epitaxy-Grown GaN on Sapphire by Insertion of a Low-Temperature-Deposited Buffer Layer between High-Temperature-Grown GaN"" Jpn.J.Appl.Phys.37. L316-318 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Amano, M.Iwaya, T.Kashima, M.Katsuragawa, I.Akasaki, J.Han, S.Hearne, J.A.Flore, E.Chason and J.Figiel: "Stress and Defect Control in GaN Using Low Temperature Interlayers" Jpn.J.Appl.Phys.37. L1540-L1542

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] C.Wetzel, T.Takeuchi, H.Amano and I.Akasaki: "Valenceband splitting and luminescence Stokes shift in GaInN/GaN thin films and multiple quantum well structures" J.Crystal Growth. 189/190. 621-624 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] T.Takeuchi, S.Sota, H.Sakai, H.Amano, I.Akasaki, Y.kaneko, S.Nakagawa, Y.Yamaoka, N.Yamada: "Quantum-confined Stark effect in strained GaInN quantum wells on sapphire(0001)" J.Crystal Growth. 189/190. 616-620

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.Amano and I.Akasaki: "X-ray diffraction characterization of GaN based material (in print)" Properties, Synthesis, Characterization, and Applications of Gallium Nitride and related Compounds ed.by J.Edgar, T.S.Strite, I.Akasaki, and H.Amano. (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] C.Wetzel and I.Akasaki: "Raman and IR reflectance sturies of AlGaN (in print)" Properties, Synthesis, Characterization, and Applications of Gallium Nitride and related Compounds ed.by J.Edgar, T.S.Strite, I.Akasaki, and H.Amano (INSPEC,IEE,London, UK. (1998)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 1999-12-08  

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