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1999 Fiscal Year Final Research Report Summary

PREPARATION OF HIGH-QUALITY ELECTRONIC THIN FILMS BY LASER DROPLET EPITAXY

Research Project

Project/Area Number 10450006
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section一般
Research Field Applied materials science/Crystal engineering
Research InstitutionKANAZAWA UNIVERSITY

Principal Investigator

MORIMOTO Akiharu  Kanazawa University FACULTY OF ENGINEERING DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING, ASSOCIATE PROFESSOR, 工学部, 助教授 (60143880)

Co-Investigator(Kenkyū-buntansha) KUMEDA Minoru  Kanazawa University FACULTY OF ENGINEERING DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING, PROFESSOR, 工学部, 教授 (30019773)
SHIMIZU Tatsuo  Kanazawa University FACULTY OF ENGINEERING DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING, PROFESSOR, 工学部, 教授 (30019715)
Project Period (FY) 1998 – 1999
KeywordsPULSED LASER ABLATION / PULSED LASER DEPOSITION / LASER DROPLET EPITAXY / YAG LASER / GERMANIUM / SILICON / YTTRIUM IRON GARNET / GADOLINIUM GALLIUM GARNET
Research Abstract

Pulsed laser ablation (PLA) is known to have quite unique features in deposition process, I.e., the depositing particles consist of atomic species, clusters, and molten droplets with micron size. The aim of this study is to investigate the fabrication process of thin-film depositions by PLA using the molten droplets. In PLA process, it has been believed that droplets must be eliminated. Liquid phase epitaxy (LPE) is equilibrium process, while vapor phase epitaxy (VPE) is non-equilibrium process. In order to grow a high quality film with a low defect density, crystal growth by PLA using large number of molten droplets will be an attractive technique that allows LPE-like crystal growth using VPE-like vacuum system.
First, germanium (Ge) was employed for this study. The second harmonic of YAG laser (532 nm) was employed for producing Ge droplets efficiently. Ge film prepared at room temperature was found to have a large number of solidified droplets on the substrate. As the substrate temperature was elevated up to 600 ℃ , Ge film was formed as island structure on (100)Si substrates. The x-ray pole figure measurement revealed that Ge film showed growth of Ge crystal aligned in plane as well as out of plane in a manner of cube-on-cube.
Yttrium Iron Garnet (YIG) was the second target for this study. YIG is known to be a excellent material for microwave applications. YIG films were grown by PLA on (111)GGG substrates using the YAG laser. Highly oriented YIG crystal were grown on the (111)GGG substrate heated at 860 ℃ by PLA using a large number of molten droplets, suggesting an LPE-like growth. This YIG films shows a small ferromagnetic resonance linewidth of 7.5 Oe. This value is quite small for films prepared by vapor-phase epitaxy techniques.

  • Research Products

    (20 results)

All Other

All Publications (20 results)

  • [Publications] S. Yamada, S. Oguri, A. Morimoto, T. Shimizu, T. Minamikawa, Y. Yonezawa: "Preparation of Epitaxial Ge Film on Si by Pulsed Laser Ablation using Molten Droplets"Jpn. J. Appl. Phys.. (3月出版予定). (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A. Morimoto, Y. Maeda, T. Minamikawa, Y. Yonezawa, T. Shimizu: "LPE-Like Crystal Growth of YIG Ferrimagnetic Thin Films by Pulsed Laser Ablation with Molten Droplets"Appl. Phys. A. Vol.69. S703-S706 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A. Morimoto, S. Oguri, T. Shimizu, T. Minamikawa, Y. Yonezawa: "Epitaxial Growth of Ge Film on Si by Pulsed Laser Ablation using Droplets"Proc. of the 5th Int. Symp. on Sputtering & Plasma Processes. ISSP'99. 19-20 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A. Masuda, S. Morita, H. Shigeno, A. Morimoto, T. Shimizu, J. Wu, H. Yaguchi, K. Onabe: "Fabrication of Pb(Zr,Ti)O_3/MgO/GaN/GaAs Structure for Optoelectronic Device Applications"J. Crystal Growth. Vol.190. 227-230 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y. Yonezawa, T. Minamikawa, A. Morimoto, T. Shimizu: "Removal of Surface Oxides on Copper by Pulsed Laser Irradiation"Jpn. J. Appl. Phys.. Vol.37. 4505-4509 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A. Morimoto, H. Takizawa, Y. Yonezawa, M. Kumeda, T. Shimizu: "Photoluminescence Enhanced by Excimer Laser Irradiation in Silicon Oxide Films Prepared by Pulsed Laser Ablation"J. Non-Crystal Sol.. Vol.227-230. 493-497 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A. Morimoto, H. Shigeno, S. Morita, Y. Yonezawa, T. Shimizu: "Effect of Nitrogen Gas on Preparation of Ti-Al-N Thin Films by Pulsed Laser Ablation"applied surface science. Vol.127-129. 994-998 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] A. Morimoto, K. Takezawa, T. Minamikawa, Y. Yonezawa, T. Shimizu: "Low-temperature Growth of YBCO Films by Pulsed Laser Ablation in Reductive Environment"applied surface science. Vol.127-129. 963-967 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] Y. Yonezawa, T. Minamikawa, K. Matsuda, K. Takezawa, A. Morimoto, T. Shimizu: "Size Distribution of Droplets in Film Prepared by Pulsed Laser Ablation"applied surface science. Vol.127-129. 639-644 (1998)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] 森本章治、清水立生(他49名): "〔図解〕薄膜技法 2.11組成制御技術"培風館(日本表面科学会編). 2 (1999)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] S. Yamada, S. Oguri, A. Morimoto, T. Shimizu, T. Minamikawa, Y. Yonezawa: "Preparation of Epitaxial Ge Film on Si by Pulsed Laser Ablation using Molten Droplets,"Jpn. J. Appl. Phys.. (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Morimoto, Y. Maeda, T. Minamikawa, Y. Yonezawa, T. Shimizu: "LPE-Like Crystal Growth of YIG Ferrimagnetic Thin Films by Pulsed Laser Ablation with Molten Droplets,"Appl. Phys. a. Vol. 69, No. 7. S703-S706 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Morimoto, S. Oguri, T. Shimizu, T. Minamikawa, Y. Yonezawa: "Epitaxial Growth of Ge Film on Si by Pulsed Laser Ablation using Droplets,"Proc. of the 5th Int. Symp. on Sputtering & Plasma Processes (ISSP'99). 19-20 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Masuda, S. Morita, H. Shigeno, A. Morimoto, T. Shimizu, J. Wu, H. Yaguchi, K. Onabe: "Fabrication of Pb(Zr, Ti)OィイD23ィエD2/MgO/GaN/GaAs Structure for Optoelectronic Device Applications,"J. Crystal Growth. Vol. 190. 227-230 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y. Yonezawa, T. Minamikawa, A. Morimoto, T. Shimizu: "Removal of Surface Oxides on Copper by Pulsed Laser Irradiation"Jpn. J. Appl. Phys.. Vol. 37, No. 8. 4505-4509 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Morimoto, H. Takizawa, Y. Yonezawa, M. Kumeda, T. Shimizu: "Photoluminescence Enhanced by Excimer Laser Irradiation in Silicon Oxide Films Prepared by Pulsed Laser Ablation,"J. Non-Crystal. Sol.. Vol. 227-230. 493-497 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Morimoto, H. Shigeno, S. Morita, Y. Yonezawa, T. Shimizu: "Effect of Nitrogen Gas on Preparation of Ti-Al-N Thin Films by Pulsed Laser Ablation,"applied surface science. Vol. 127-129. 994-998 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Morimoto, K. Takezawa, T. Minamikawa, Y. Yonezawa, T. Shimizu: "Low-temperature Growth of YBCO Thin Films by Pulsed Laser Ablation in Reductive Environment"applied surface science. Vol. 127-129. 963-967 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] Y. Yonezawa, T. Minamikawa, K. Matsuda, K. Takezawa, A. Morimoto, T. Shimizu: "Size Distribution of Droplets in Film Prepared by Pulsed Laser Ablation"applied surface science. Vol. 127-129. 639-644 (1998)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] A. Morimoto and T. Shimizu: "2.11 Composition Control, "Zukai Hakumaku Gijutu""Baifu-kan, (in Japanese). (1999)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2001-10-23  

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