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2001 Fiscal Year Final Research Report Summary

Study on New Semiconductors for Temperature-insensitive Wavelength Semiconductor Lasers

Research Project

Project/Area Number 11555087
Research Category

Grant-in-Aid for Scientific Research (B)

Allocation TypeSingle-year Grants
Section展開研究
Research Field Electronic materials/Electric materials
Research InstitutionKyoto Institute of Technology

Principal Investigator

OE Kunishige  Kyoto Institute of Technology, Faculty of Engineering and Design, Professor, 工芸学部, 教授 (20303927)

Co-Investigator(Kenkyū-buntansha) NAGNUMA Mitsuru  NTT Optoelectronics Laboratories Senior Research Engineer, 主幹研究員
FUKUZAWA Masayuki  Kyoto Institute of Technology, Faculty of Engineering and Design, Assistant, 工芸学部, 助手 (60293990)
YAMADA Masayoshi  Kyoto Institute of Technology, Faculty of Engineering and Design, Professor, 工芸学部, 教授 (70029320)
Project Period (FY) 1999 – 2001
Keywordstemperature-insensitive / GaAsBi alloy / Bi-containing semiconductor / semiconductor laser / metastable / MOVPE growth
Research Abstract

A new semiconductor material consisting of semiconductor and semimetal which has a temperature-insensitive band gap has been studied to develop a semiconductor laser whose wavelength does not change when the ambient temperature Changes. The detailed growth conditions and the characteristics of GaAs_<1-x>Bi_x semiconductor alloy layers have been studied. The lattice constants of the alloy were found to increase with the addition of Bi. The uniformity and the reproducibility of the solid composition of the GaAs_<1-x>Bi_x epilayers are good in spite of the difficulty of epitaxial growth. Although layer growth was performed at a low temperature, the stability of GaAs_<1-x>Bi_x alloy was sufficient for device processing. The photoluminescence (PL) spectra show that the PL peak energy of the GaAs_<1-x>Bi_x alloy shifts to a longer wavelength with increasing Bi content. The temperature dependence of the PL peak energy is much weaker than the temperature variation of the band gap of GaAs. The results obtained in this research support the hypothesis that III-V alloy semiconductors consisting of semiconductor and semimetal components have a temperature-insensitive band gap.
To create a semiconductor material of optical fiber communication wavelength, GaInAsBi alloy has been targetted. The epitaxial growth of GaInAs, the host crystal of the alloy, was examined at low temperatures. Using new method, GaInAs layers of good optical quality were grown even at 420 C. However the growth temperature could not be lowered any further even using a new Ga precursor, TiPGa. New precursors of Ga and In which enable the growth of GaInAs at 365 C are expected, which will allow the growth of the new GaInAsBi alloy.

  • Research Products

    (21 results)

All Other

All Publications (21 results)

  • [Publications] K.Oe: "Low Temperature Metalorganic Vapor-phase Epitaxial Growth of InGaAs Layers on n-InP Substrates"J. Crystal Growth. 219. 10-16 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Oe: "Optical Characteristics of New Semicondutor Alloy ; GaAs_<1-x>Bi_x"Proc : 2000 IEEE LEOS Annual Meeting Conf.. 788-789 (2000)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] J.Yoshida: "Optical Transitions in New Semiconductor Alloy GaAs_<1-x>Bi_x with Temperature-insensitive Band Gap"Proc. 13th International Conf. InP and Related Materials. 109-112 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] P.Verma: "Raman Studies on GaAs_<1-x>Bi_x and InAs_<1-x>Bi_x"J. Appl. Phys.. 89. 1657-1663 (2001)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Oe: "Metalorganic Vapor Phase Epitaxial Growth of Metastable GaAsBi Alloy"J. Crystal Growth. (印刷中).

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.Oe: "Characteristics of Semiconductor Alloy GaAsBi"Jpn. J. Appl. Phys.. (印刷中).

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] K.OE, H.OKAMOTO, and M.NAKAO: "Low temperature growth of GaInAs by MOVPE"Proc. of 11th Intern. Conf. on Indium Phosphide and Related Materials, Davos, Switzerland, May. 131-134 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K.OE: "GaInAs MOVPE.growth at low temperature"Extended Abstracts of the 18th Electronic Materials Symposium, Kii-Shirahama, June-July. 207-208 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.OFUCHI, T.KUBO, M.TABUCHI, Y.TAKEDA, H.OKAMOTO, and R.OE: "Fluorescence EXAFS study on local structures around Bi atoms in InAsBi grown by low-pressure MOVPE"Jpn. J. Appl. Phys.. Vol. 38, Suppl. 38-1. 545-547 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] H.OKAMOTO and K.OE: "Structural and energygap characterization of metal-organic vapor phase epitaxy grown InAsBi"Jpn. J. Appl. Phys. Vol. 38, No.2B. 1022-1025 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] M.HERMS, V.G.MELOV, P.VERMA, G.IRMER, H.OKAMOTO, M.FUKUZAWA, K.OE, and M.YAMADA: "Characterization of GaAsBi epilayers by Raman scattering and X-ray diffraction"Extended Abstract of the 8^<th> European Workshop on Metal-Organic Vapor Phase Epitaxy and Related Growth Techniques, Prague, Czech, June. 249-252 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] P.VERMA, M.HERMS, G.IRMER, H.OKAMOTO, M.FUKUZAWA, K.OE, and M YAMADA: "Micro-Raman Investigation of InAsBi epilayers grown MOVPE"Abstract of the 8th Intern. Conf. on Defects-Recognition, Imaging and Physics in Semiconductors, Narita, Japan, September. P55-11 (1999)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. OE: "MOVPE Growth and Characterization of GaAs_<1-x>Bi_x Metastable Alloys"Extended Abstracts Of the 19th Electronic Materials Symposium, Izu-Nagaoka June. 121-122 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] R VERMA, M. HERMS, ,G. IRMER, M. YAMADA, H. OKAMOTO, and K. OE: "Raman Probe of New Laser Materials GaAs_<1-x>Bi_x and InAs_<1-x>Bi_x"Proceedings of SPIE. Vol. 3945. 168-173 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. OE: "Low Temperature Metalorganic Vaporphase Epitaxial Growth of InGaAs Layers n-InP Substrates"J. Crystal Growth. Vol. 219. 10-16 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. OE: "Optical Characteristics of New Semiconductor Alloy, GaAs_<1-x>Bi_x"2000 IEEE LEOS Annual Meeting conference Proceeding, Puetro Rico. 788-789 (2000)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] P. VERMA, K. OE, M. YAMADA, H. HARIMA, M. HERMS, and G. IRMER: "Raman Studies on GaAs_<1-x>Bi_x and InAs_<1-x>Bi_x"J. Appl. Phys.. Vol. 89, No.3. 1657-1663 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] J. YOSHIDA, H. YAMAMIZU, T. KITA, AND K. OE.: "Optical Transitions in new Semiconductor Alloy GaAs_<1-x>Bi_x with Temperatere-insensitive Band Gap"Proc. of 13th International Conference on Inp and rated Materials, Nara, May. 109-112 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. OE: "Metalorganic Vapor Phase Epitaxial Growth of Metastable GaAsBi Alloy"Abstract of 13th International Conference on InP and Related Materials, Nara, May. 227 (2001)

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. OE: "Metalorganic Vapor Phase Epitaxial Growth of Metastable GaAsBi Alloy"J. Crystal Growth. (in press).

    • Description
      「研究成果報告書概要(欧文)」より
  • [Publications] K. OE: "Characteristics of the Semiconductor Alloy ; GaAsBi"Japanese Journal of Applied Physics. (in press).

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2003-09-17  

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