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2002 Fiscal Year Final Research Report Summary

Absorption linewidth measurement of reactive molecular electrinic states by nonlinear optical spectroscopy.

Research Project

Project/Area Number 13640520
Research Category

Grant-in-Aid for Scientific Research (C)

Allocation TypeSingle-year Grants
Section一般
Research Field Physical chemistry
Research InstitutionThe Institute of Physical and Chemical Research

Principal Investigator

KOBAYASHI Tohru  Condensed Molecular Materials Lab. , Senior Researcher, 分子物性化学研究室, 先任研究員 (70202067)

Co-Investigator(Kenkyū-buntansha) MATSUO Yukari  RI Beam Science Lab. , Senior Researcher, RIビーム科学研究室, 先任研究員 (50231593)
Project Period (FY) 2001 – 2002
Keywordspulse amplification / high resolution laser / second harmonic / linewidth / molecular dynamics / ablation
Research Abstract

We have produced high resolution UV light of 200MHz linewidth by a pulse anplification of the output of a CW Ti : Sapphire laser with a XeCl excimer laser conbined with a second harmonic crystal. The linewidth is only one fifth of the commercial pulsed dye laser and it will be highly effective for the precise linewidth measurement of absorption spectra.
By using this UV light, we have measured Doppler linewidth of the absorption spectra of SiO^+ produced by laser ablation under oxygen atmosphere in order to investigate translational motion of ion in expanding ablation plasma. From the analysis, we have reproduced oscillation of ablation plasma which was expected from theoretical calculation.
We are going to use this system for the spectroscopic study of reactive electronic states.

  • Research Products

    (2 results)

All Other

All Publications (2 results)

  • [Publications] T.Mogi, Y.Fukuyama, T.Kobayashi, I.Tanihata, K.Uehara, Y.Matsuo: "Translational motion of SiO^+ produced by laser ablation"Applied Surface Science. 197-198. 202-206 (2002)

    • Description
      「研究成果報告書概要(和文)」より
  • [Publications] T. Mogi, Y. Fukuyama, T. Kobayashi, I.Tanihata, K. Uehara, and Y. Matsuo: "Translational motion of SiO^+ produced by laser ablation"Applied Surface Science. 197-198. 202-206 (2002)

    • Description
      「研究成果報告書概要(欧文)」より

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Published: 2004-04-14  

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