2016 Fiscal Year Annual Research Report
Plasmonic hybrid cavity-channel structure for subwavelength nanolasing
| Project/Area Number |
15F15359
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| Research Institution | The University of Tokyo |
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Principal Investigator |
J・J Delaunay 東京大学, 大学院工学系研究科(工学部), 准教授 (80376516)
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| Co-Investigator(Kenkyū-buntansha) |
HO YA-LUN 東京大学, 大学院工学系研究科(工学部), 外国人特別研究員
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| Project Period (FY) |
2015-11-09 – 2018-03-31
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| Keywords | Plasmonics / Surface plasmons |
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| Outline of Annual Research Achievements |
This proposal is related to the demonstration of nanolasers using the property of plasmonic nanofin structure developed in our laboratory. We propose to show that nanofins can be used to strongly confine light in new sub-wavelength structures and design a new structure consisting of a subwavelength channel made of the lasing material which is embedded between plasmonic nanofin structures. The nanofins embedding the channel are plasmonic resonant structures, which are used to “focus” light in the channel. Due to the efficient light confinement provided by the sub-wavelength nanofins plasmonic structure, a very low lasing threshold is expected and a nanosize light source could be achieved.
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| Current Status of Research Progress |
Current Status of Research Progress
3: Progress in research has been slightly delayed.
Reason
A structure using ZnO as the active material was optimized to achieve lasing. The fabrication technique of the structure was partly established. Unfortunately, the etching step required for the fabrication was found to damage the active material, so that the observed photoluminescence of the active material was modified in a detrimental manner. Different strategies have been tried to alleviate this issue, but so far the density of the damages created in the active material is still too high to achieve lasing with the fabricated structure. The setup used in the emission characterization of the fabricated device was almost completed and the active material in the form of thin film was characterized. It was confirmed that the active material had the required photoluminescence property.
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| Strategy for Future Research Activity |
The fabrication technique will be refined and new strategies to heal the active material from the damages generated during the etching step will be tried. For example, post treatments of the etched active materials will be attempted using annealing and plasma treatments. Also, the setup used to characterize the emission of the structure will be completed. Presentation at a conference will be given.
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Research Products
(8 results)
