Study on room temperature atomic layer deposition and its application

2017 Fiscal Year Final Research Report

• Project/Area Number: 15H03536
• Research Category: Grant-in-Aid for Scientific Research (B)
• Allocation Type: Single-year Grants
• Section: 一般
• Research Field: Nanomaterials engineering
• Research Institution: Yamagata University
• Principal Investigator: Hirose Fumihiko 山形大学, 大学院理工学研究科, 教授 (50372339)
• Project Period (FY): 2015-04-01 – 2018-03-31
• Keywords: 原子層堆積 / 薄膜 / 吸着 / 太陽電池 / 赤外吸収分光

Outline of Final Research Achievements

In this study, we aimed to develop a combinative oxide RT depositon method by using RT atomic layer depoition (ALD). By investigating the coadsorption reaction of the different precursors, we constructed the ALD process where the Al/(Al+Si) atomic ratio can be controlled in the range from 0.4 to 0.8. The fabricated alumina-silica film is applicable as an adsorbent of cations. When we apply this film to the photoanodes of the dye sensitized solar cells, it was confirmed that the photo current was enhanced. The present technology is applicable for decorating the photoanodes to enhance the power generation efficiency of dye sensitized solar cells.

Free Research Field

ナノテクノロジー