2017 Fiscal Year Final Research Report
Electric-field control of electronic phase change properties in transition-metal oxides
Project/Area Number |
15H03567
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Research Category |
Grant-in-Aid for Scientific Research (B)
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Allocation Type | Single-year Grants |
Section | 一般 |
Research Field |
Thin film/Surface and interfacial physical properties
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Research Institution | Tohoku University |
Principal Investigator |
Fujiwara Kohei 東北大学, 金属材料研究所, 講師 (50525855)
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Project Period (FY) |
2015-04-01 – 2018-03-31
|
Keywords | 電気二重層トランジスタ / 電界効果トランジスタ |
Outline of Final Research Achievements |
Electric-field control of functional properties in transition-metal oxides has been considered as a key technology for development of next-generation electronic devices. Recent studies have shown that, by using electric-double-layer transistors, properties of oxide channels can be largely modulated via field-induced redox reactions as well as electrostatic carrier accumulation induced by the strong electric field. In this project, various rutile-type oxide films have been synthesized by a reactive sputtering technique for use in electric-double-layer transistors. Also, a three-terminal device that employs a solid-state electrolyte as the gate dielectric layer has been constructed.
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Free Research Field |
酸化物エレクトロニクス
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