2006 Fiscal Year Final Research Report Summary
Synthesis of near future electromagnetic noise suppressor with nano-granular structure and their application to electric devices.
| Project/Area Number |
16360351
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| Research Category |
Grant-in-Aid for Scientific Research (B)
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| Allocation Type | Single-year Grants |
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| Section | 一般 |
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| Research Field |
Structural/Functional materials
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| Research Institution | Research Institute for Electric and Magnetic Materials (RIEMM) |
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Principal Investigator |
OHNUMA Shigehiro RIEMM, Thin film Gr., Senior Researcher, 薄膜材料グループ, 主任研究員 (50142633)
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| Co-Investigator(Kenkyū-buntansha) |
KOBAYASHI Nobukiyo RIEMM, Thin film Gr., Researcher, 薄膜材料Gr, 研究員 (70205475)
YAMAGUCHI Masahiro Tohoku Univ., Professor, 大学院工学研究科, 教授 (10174632)
ONO Yuhji NEC Tokin Co., Manager, トーキン(株)ENCデバイス事業部, 主任
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| Project Period (FY) |
2004 – 2006
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| Keywords | Magnetic thin film / Electromagnetic noise suppression / GHz band / Nano-granular structure / Deposition at low temperature / Electric resistive loss / Magnetic loss / Micro magnetic probe method |
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| Research Abstract |
1. Investigation of electromagnetic noise suppressor at GHz range : Nano-granular soft magnetic films with different electric resistivity were investigated to find the excellent electromagnetic noise suppressor at GHz band. The noise suppression effect of nano-granular films has been found to originate in two losses, that is, magnetic loss and electric resistive loss (eddy current loss). It is also found that noise suppressor suitable for optional electric devices is realized by combining two losses which is attributed to film compositions.
2. Establishment of film deposition method at low temperature : The substrate temperature (Tsub.) increases up to 100 C or more in conventional sputtering deposition, especially, around 300 C in the case of reactive spattering. Such a high temperature of Tsub limits the application field of the film. We have tried to find the deposition method in lower Tsub than 100 C using Facing Targets Sputtering System. Systematically investigating the parameters of sputtering is found to realize Tsub less than 85 C during deposition. The new method expands the substrate materials not only Si and glass but also polymer with low phase transformation temperature or electric devices directly.
3. Test for practical application : The nano-granular soft magnetic films were sputter-deposited on the surface of LSI by the deposition method shown in 2. We could not find any mechanical or electrical damage in LSI with the deposition. The electromagnetic noise from the surface has been evaluated by a micro magnetic probe method. Considerable amount of noise suppressing is observed in the surface of LSI covered with the films, compared with the result of nude LSI.
All the research objectives have been achieved, described above.
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Research Products
(10 results)
